Removal of trace ammonia by ionic liquids
Ammonia (NH3), a critical process gas in semiconductor production, is the second largest air pollution from semiconductor factories as well as one of PM2.5 precursors. NH3 emission standard will be regulated more strictly from current 2.5 ppm to 0.8 ppm as revealed by the 2025 semiconductor air poll...
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| Main Authors: | Hsu Chih-Han, Lee Wei-Chih, Chen Jiun-Jen, Kang Yu-hao |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
EDP Sciences
2025-01-01
|
| Series: | E3S Web of Conferences |
| Online Access: | https://www.e3s-conferences.org/articles/e3sconf/pdf/2025/20/e3sconf_icepp2024_02002.pdf |
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