Comprehensive Optimization of Dual Threshold Independent-Gate FinFET and SRAM Cells

Independent-Gate (IG) FinFET is a promising device in circuit applications due to its two separated gates, which can be used independently. In this paper, we proposed a comprehensive method to optimize the Dual Threshold (DT) IG FinFET devices by carrying out modulations for the gate electrode work...

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Bibliographic Details
Main Authors: Haiyan Ni, Jianping Hu, Huishan Yang, Haotian Zhu
Format: Article
Language:English
Published: Wiley 2018-01-01
Series:Active and Passive Electronic Components
Online Access:http://dx.doi.org/10.1155/2018/4512924
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