Grayscale Lithography and a Brief Introduction to Other Widely Used Lithographic Methods: A State-of-the-Art Review
Lithography serves as a fundamental process in the realms of microfabrication and nanotechnology, facilitating the transfer of intricate patterns onto a substrate, typically in the form of a wafer or a flat surface. Grayscale lithography (GSL) is highly valued in precision manufacturing and research...
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MDPI AG
2024-10-01
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| author | Svetlana N. Khonina Nikolay L. Kazanskiy Muhammad A. Butt |
| author_facet | Svetlana N. Khonina Nikolay L. Kazanskiy Muhammad A. Butt |
| author_sort | Svetlana N. Khonina |
| collection | DOAJ |
| description | Lithography serves as a fundamental process in the realms of microfabrication and nanotechnology, facilitating the transfer of intricate patterns onto a substrate, typically in the form of a wafer or a flat surface. Grayscale lithography (GSL) is highly valued in precision manufacturing and research endeavors because of its unique capacity to create intricate and customizable patterns with varying depths and intensities. Unlike traditional binary lithography, which produces discrete on/off features, GSL offers a spectrum of exposure levels. This enables the production of complex microstructures, diffractive optical elements, 3D micro-optics, and other nanoscale designs with smooth gradients and intricate surface profiles. GSL plays a crucial role in sectors such as microelectronics, micro-optics, MEMS/NEMS manufacturing, and photonics, where precise control over feature depth, shape, and intensity is critical for achieving advanced functionality. Its versatility and capacity to generate tailored structures make GSL an indispensable tool in various cutting-edge applications. This review will delve into several lithographic techniques, with a particular emphasis on masked and maskless GSL methods. As these technologies continue to evolve, the future of 3D micro- and nanostructure manufacturing will undoubtedly assume even greater significance in various applications. |
| format | Article |
| id | doaj-art-6536c0affa4448fcb432345f3952c608 |
| institution | OA Journals |
| issn | 2072-666X |
| language | English |
| publishDate | 2024-10-01 |
| publisher | MDPI AG |
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| series | Micromachines |
| spelling | doaj-art-6536c0affa4448fcb432345f3952c6082025-08-20T02:04:59ZengMDPI AGMicromachines2072-666X2024-10-011511132110.3390/mi15111321Grayscale Lithography and a Brief Introduction to Other Widely Used Lithographic Methods: A State-of-the-Art ReviewSvetlana N. Khonina0Nikolay L. Kazanskiy1Muhammad A. Butt2Samara National Research University, 443086 Samara, RussiaSamara National Research University, 443086 Samara, RussiaSamara National Research University, 443086 Samara, RussiaLithography serves as a fundamental process in the realms of microfabrication and nanotechnology, facilitating the transfer of intricate patterns onto a substrate, typically in the form of a wafer or a flat surface. Grayscale lithography (GSL) is highly valued in precision manufacturing and research endeavors because of its unique capacity to create intricate and customizable patterns with varying depths and intensities. Unlike traditional binary lithography, which produces discrete on/off features, GSL offers a spectrum of exposure levels. This enables the production of complex microstructures, diffractive optical elements, 3D micro-optics, and other nanoscale designs with smooth gradients and intricate surface profiles. GSL plays a crucial role in sectors such as microelectronics, micro-optics, MEMS/NEMS manufacturing, and photonics, where precise control over feature depth, shape, and intensity is critical for achieving advanced functionality. Its versatility and capacity to generate tailored structures make GSL an indispensable tool in various cutting-edge applications. This review will delve into several lithographic techniques, with a particular emphasis on masked and maskless GSL methods. As these technologies continue to evolve, the future of 3D micro- and nanostructure manufacturing will undoubtedly assume even greater significance in various applications.https://www.mdpi.com/2072-666X/15/11/1321grayscale lithographyelectron beam lithographyultraviolet lithographynanoimprint lithographylaser lithography |
| spellingShingle | Svetlana N. Khonina Nikolay L. Kazanskiy Muhammad A. Butt Grayscale Lithography and a Brief Introduction to Other Widely Used Lithographic Methods: A State-of-the-Art Review Micromachines grayscale lithography electron beam lithography ultraviolet lithography nanoimprint lithography laser lithography |
| title | Grayscale Lithography and a Brief Introduction to Other Widely Used Lithographic Methods: A State-of-the-Art Review |
| title_full | Grayscale Lithography and a Brief Introduction to Other Widely Used Lithographic Methods: A State-of-the-Art Review |
| title_fullStr | Grayscale Lithography and a Brief Introduction to Other Widely Used Lithographic Methods: A State-of-the-Art Review |
| title_full_unstemmed | Grayscale Lithography and a Brief Introduction to Other Widely Used Lithographic Methods: A State-of-the-Art Review |
| title_short | Grayscale Lithography and a Brief Introduction to Other Widely Used Lithographic Methods: A State-of-the-Art Review |
| title_sort | grayscale lithography and a brief introduction to other widely used lithographic methods a state of the art review |
| topic | grayscale lithography electron beam lithography ultraviolet lithography nanoimprint lithography laser lithography |
| url | https://www.mdpi.com/2072-666X/15/11/1321 |
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