Protocol for lateral patterning of van der Waals heterostructures using sequential chemical vapor deposition
Summary: Previous work demonstrates that scalable area-selective deposition of van der Waals monolayers enables tunable design of atomically thin electronic and photonic platforms. Here, we present a protocol for lateral patterning of MoS2–WS2 heterostructures using sequential chemical vapor deposit...
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| Format: | Article |
| Language: | English |
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Elsevier
2025-06-01
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| Series: | STAR Protocols |
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| Online Access: | http://www.sciencedirect.com/science/article/pii/S2666166725001613 |
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| author | Soonyoung Cha Hyeuk-Jin Han Ji-Hoon Ahn Gangtae Jin |
| author_facet | Soonyoung Cha Hyeuk-Jin Han Ji-Hoon Ahn Gangtae Jin |
| author_sort | Soonyoung Cha |
| collection | DOAJ |
| description | Summary: Previous work demonstrates that scalable area-selective deposition of van der Waals monolayers enables tunable design of atomically thin electronic and photonic platforms. Here, we present a protocol for lateral patterning of MoS2–WS2 heterostructures using sequential chemical vapor deposition. We describe steps for constructing patterned lateral heterostructures with alternating channels from nanometers to micrometers. This protocol has potential application in next-generation atomically thin electronic circuits.For complete details on the use and execution of this protocol, please refer to Lee et al.1 : Publisher’s note: Undertaking any experimental protocol requires adherence to local institutional guidelines for laboratory safety and ethics. |
| format | Article |
| id | doaj-art-645c2463a23e49159555c6046c2a2ce5 |
| institution | OA Journals |
| issn | 2666-1667 |
| language | English |
| publishDate | 2025-06-01 |
| publisher | Elsevier |
| record_format | Article |
| series | STAR Protocols |
| spelling | doaj-art-645c2463a23e49159555c6046c2a2ce52025-08-20T02:16:29ZengElsevierSTAR Protocols2666-16672025-06-016210375510.1016/j.xpro.2025.103755Protocol for lateral patterning of van der Waals heterostructures using sequential chemical vapor depositionSoonyoung Cha0Hyeuk-Jin Han1Ji-Hoon Ahn2Gangtae Jin3Department of Physics and Astronomy, University of California, Riverside, Riverside, CA, USADepartment of Environment and Energy Engineering, Sungshin Women’s University, Seoul 01133, Republic of KoreaDepartment of Materials Science and Chemical Engineering, Hanyang University, 55 Hanyangdaehak-ro, Sangnok-gu, Ansan 15588, Republic of Korea; Corresponding authorDepartment of Electronic Engineering, Gachon University, Seongnam 13120, Republic of Korea; Corresponding authorSummary: Previous work demonstrates that scalable area-selective deposition of van der Waals monolayers enables tunable design of atomically thin electronic and photonic platforms. Here, we present a protocol for lateral patterning of MoS2–WS2 heterostructures using sequential chemical vapor deposition. We describe steps for constructing patterned lateral heterostructures with alternating channels from nanometers to micrometers. This protocol has potential application in next-generation atomically thin electronic circuits.For complete details on the use and execution of this protocol, please refer to Lee et al.1 : Publisher’s note: Undertaking any experimental protocol requires adherence to local institutional guidelines for laboratory safety and ethics.http://www.sciencedirect.com/science/article/pii/S2666166725001613PhysicsChemistryMaterial sciences |
| spellingShingle | Soonyoung Cha Hyeuk-Jin Han Ji-Hoon Ahn Gangtae Jin Protocol for lateral patterning of van der Waals heterostructures using sequential chemical vapor deposition STAR Protocols Physics Chemistry Material sciences |
| title | Protocol for lateral patterning of van der Waals heterostructures using sequential chemical vapor deposition |
| title_full | Protocol for lateral patterning of van der Waals heterostructures using sequential chemical vapor deposition |
| title_fullStr | Protocol for lateral patterning of van der Waals heterostructures using sequential chemical vapor deposition |
| title_full_unstemmed | Protocol for lateral patterning of van der Waals heterostructures using sequential chemical vapor deposition |
| title_short | Protocol for lateral patterning of van der Waals heterostructures using sequential chemical vapor deposition |
| title_sort | protocol for lateral patterning of van der waals heterostructures using sequential chemical vapor deposition |
| topic | Physics Chemistry Material sciences |
| url | http://www.sciencedirect.com/science/article/pii/S2666166725001613 |
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