Reductive Thermal ALD of Pd and Pd2Ge From a Novel Recyclable Palladium Chloride Adduct

Abstract In this work, a new ALD process for palladium metal thin films using dichlorobis(triethylphosphine)palladium(II) (PdCl2(PEt3)2) and 1,4‐bis(trimethylsilyl)‐1,4‐dihydropyrazine ((Me3Si)2DHP) as reactants, is developed. The metal precursor is chosen based on the known reactivity of metal hali...

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Main Authors: Anton Vihervaara, Timo Hatanpää, Mikko‐Ilmari Selänne, Kenichiro Mizohata, Mikko Ritala
Format: Article
Language:English
Published: Wiley-VCH 2025-02-01
Series:Advanced Materials Interfaces
Subjects:
Online Access:https://doi.org/10.1002/admi.202400579
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_version_ 1832542896104931328
author Anton Vihervaara
Timo Hatanpää
Mikko‐Ilmari Selänne
Kenichiro Mizohata
Mikko Ritala
author_facet Anton Vihervaara
Timo Hatanpää
Mikko‐Ilmari Selänne
Kenichiro Mizohata
Mikko Ritala
author_sort Anton Vihervaara
collection DOAJ
description Abstract In this work, a new ALD process for palladium metal thin films using dichlorobis(triethylphosphine)palladium(II) (PdCl2(PEt3)2) and 1,4‐bis(trimethylsilyl)‐1,4‐dihydropyrazine ((Me3Si)2DHP) as reactants, is developed. The metal precursor is chosen based on the known reactivity of metal halides with the DHP‐type reducing agents. Metallic Pd films are deposited at temperatures of 140–180 °C with a growth rate of 0.3–0.4 Å cycle−1. Furthermore using 1,4‐bis(trimethylgermyl)‐1,4‐dihydropyrazine ((Me3Ge)2DHP) as the co‐reactant yielded Pd2Ge thin films. Finally, full recyclability of the PdCl2(PEt3)2 is observed: unused molecules condensed in the exhaust tube can be collected by dissolving them into acetone, purified by recrystallization, and reused.
format Article
id doaj-art-63b4454be93141bf8acaccc802b9aede
institution Kabale University
issn 2196-7350
language English
publishDate 2025-02-01
publisher Wiley-VCH
record_format Article
series Advanced Materials Interfaces
spelling doaj-art-63b4454be93141bf8acaccc802b9aede2025-02-03T13:24:05ZengWiley-VCHAdvanced Materials Interfaces2196-73502025-02-01123n/an/a10.1002/admi.202400579Reductive Thermal ALD of Pd and Pd2Ge From a Novel Recyclable Palladium Chloride AdductAnton Vihervaara0Timo Hatanpää1Mikko‐Ilmari Selänne2Kenichiro Mizohata3Mikko Ritala4Department of Chemistry University of Helsinki P.O. Box 55 Helsinki FI‐00014 FinlandDepartment of Chemistry University of Helsinki P.O. Box 55 Helsinki FI‐00014 FinlandDepartment of Chemistry University of Helsinki P.O. Box 55 Helsinki FI‐00014 FinlandDepartment of Physics University of Helsinki P.O. Box 43 Helsinki FI‐00014 FinlandDepartment of Chemistry University of Helsinki P.O. Box 55 Helsinki FI‐00014 FinlandAbstract In this work, a new ALD process for palladium metal thin films using dichlorobis(triethylphosphine)palladium(II) (PdCl2(PEt3)2) and 1,4‐bis(trimethylsilyl)‐1,4‐dihydropyrazine ((Me3Si)2DHP) as reactants, is developed. The metal precursor is chosen based on the known reactivity of metal halides with the DHP‐type reducing agents. Metallic Pd films are deposited at temperatures of 140–180 °C with a growth rate of 0.3–0.4 Å cycle−1. Furthermore using 1,4‐bis(trimethylgermyl)‐1,4‐dihydropyrazine ((Me3Ge)2DHP) as the co‐reactant yielded Pd2Ge thin films. Finally, full recyclability of the PdCl2(PEt3)2 is observed: unused molecules condensed in the exhaust tube can be collected by dissolving them into acetone, purified by recrystallization, and reused.https://doi.org/10.1002/admi.202400579atomic layer depositionpalladium halide adductspalladium thin filmsreducing agent
spellingShingle Anton Vihervaara
Timo Hatanpää
Mikko‐Ilmari Selänne
Kenichiro Mizohata
Mikko Ritala
Reductive Thermal ALD of Pd and Pd2Ge From a Novel Recyclable Palladium Chloride Adduct
Advanced Materials Interfaces
atomic layer deposition
palladium halide adducts
palladium thin films
reducing agent
title Reductive Thermal ALD of Pd and Pd2Ge From a Novel Recyclable Palladium Chloride Adduct
title_full Reductive Thermal ALD of Pd and Pd2Ge From a Novel Recyclable Palladium Chloride Adduct
title_fullStr Reductive Thermal ALD of Pd and Pd2Ge From a Novel Recyclable Palladium Chloride Adduct
title_full_unstemmed Reductive Thermal ALD of Pd and Pd2Ge From a Novel Recyclable Palladium Chloride Adduct
title_short Reductive Thermal ALD of Pd and Pd2Ge From a Novel Recyclable Palladium Chloride Adduct
title_sort reductive thermal ald of pd and pd2ge from a novel recyclable palladium chloride adduct
topic atomic layer deposition
palladium halide adducts
palladium thin films
reducing agent
url https://doi.org/10.1002/admi.202400579
work_keys_str_mv AT antonvihervaara reductivethermalaldofpdandpd2gefromanovelrecyclablepalladiumchlorideadduct
AT timohatanpaa reductivethermalaldofpdandpd2gefromanovelrecyclablepalladiumchlorideadduct
AT mikkoilmariselanne reductivethermalaldofpdandpd2gefromanovelrecyclablepalladiumchlorideadduct
AT kenichiromizohata reductivethermalaldofpdandpd2gefromanovelrecyclablepalladiumchlorideadduct
AT mikkoritala reductivethermalaldofpdandpd2gefromanovelrecyclablepalladiumchlorideadduct