Deposition of Colloidal Particles during the Evaporation of Sessile Drops: Dilute Colloidal Dispersions

The deposition of colloidal silica particles during the evaporation of sessile drops on a smooth substrate has been modeled by the simultaneous solution of the Navier–Stokes equations, the convective-diffusive equation for particles, and the diffusion equation for evaporated vapor in the gas phase....

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Bibliographic Details
Main Authors: Pei-Fang Sung, Lihui Wang, Michael T. Harris
Format: Article
Language:English
Published: Wiley 2019-01-01
Series:International Journal of Chemical Engineering
Online Access:http://dx.doi.org/10.1155/2019/7954965
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Summary:The deposition of colloidal silica particles during the evaporation of sessile drops on a smooth substrate has been modeled by the simultaneous solution of the Navier–Stokes equations, the convective-diffusive equation for particles, and the diffusion equation for evaporated vapor in the gas phase. Isothermal conditions were assumed. A mapping was created to show the conditions for various deposition patterns for very dilute suspensions. Based on values of the Peclet (Pe) number and Damkholer numbers (Da and Da−1), the effects of adsorption and desorption were discussed according to the map. Simulations were also done for suspensions with a high particle concentration to form a solid phase during the evaporation by using a packing criterion. The simulations predicted the height and width of the ring deposit near the contact line, and the results compared favorably to experimental particle deposition patterns.
ISSN:1687-806X
1687-8078