Nanoimprint crystalithography for organic semiconductors
Abstract Organic semiconductor crystals (OSCs) offer mechanical flexibility, high carrier mobility, and tunable electronic structures, making them promising for optoelectronic and photonic applications. However, traditional lithographic techniques damage OSCs due to high-energy beams or solvents, le...
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| Format: | Article |
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Nature Portfolio
2025-04-01
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| Series: | Nature Communications |
| Online Access: | https://doi.org/10.1038/s41467-025-58934-9 |
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| author | Shun-Xin Li Guan-Yao Huang Hong Xia Tairan Fu Xiao-Jie Wang Xin Zeng Xinfeng Liu Yan-Hao Yu Qi-Dai Chen Linhan Lin Hong-Bo Sun |
| author_facet | Shun-Xin Li Guan-Yao Huang Hong Xia Tairan Fu Xiao-Jie Wang Xin Zeng Xinfeng Liu Yan-Hao Yu Qi-Dai Chen Linhan Lin Hong-Bo Sun |
| author_sort | Shun-Xin Li |
| collection | DOAJ |
| description | Abstract Organic semiconductor crystals (OSCs) offer mechanical flexibility, high carrier mobility, and tunable electronic structures, making them promising for optoelectronic and photonic applications. However, traditional lithographic techniques damage OSCs due to high-energy beams or solvents, leading to high defect densities, poor uniformity, and significant device-to-device variation. Existing methods also struggle to eliminate residual layers while forming independent, complex two-dimensional patterns. A chemical-free nanoimprint crystallography (NICL) method is introduced to overcome these challenges by balancing residual-layer-free nanoimprinting with the fabrication of independent, complex 2D patterns. In situ control of crystallization kinetics via temperature gradient adjustment yields OSC nanostructures with low defect densities and good uniformity. Patterning of various OSCs over a range of feature sizes is demonstrated. The patterned OSCs exhibit good lasing performance and low device-to-device variation (as low as 2%), indicating that NICL is a promising approach for fabricating high-performance, uniform OSC-based devices. |
| format | Article |
| id | doaj-art-62a858405c5d4e83a3c9a77ccd2183e7 |
| institution | DOAJ |
| issn | 2041-1723 |
| language | English |
| publishDate | 2025-04-01 |
| publisher | Nature Portfolio |
| record_format | Article |
| series | Nature Communications |
| spelling | doaj-art-62a858405c5d4e83a3c9a77ccd2183e72025-08-20T02:55:27ZengNature PortfolioNature Communications2041-17232025-04-011611910.1038/s41467-025-58934-9Nanoimprint crystalithography for organic semiconductorsShun-Xin Li0Guan-Yao Huang1Hong Xia2Tairan Fu3Xiao-Jie Wang4Xin Zeng5Xinfeng Liu6Yan-Hao Yu7Qi-Dai Chen8Linhan Lin9Hong-Bo Sun10State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin UniversityBeijing Institute of Technology ZhuhaiState Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin UniversityKey Laboratory for Thermal Science and Power Engineering of Ministry of Education, Beijing Key Laboratory of CO2 Utilization and Reduction Technology, Department of Energy and Power Engineering, Tsinghua UniversityState Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instrument, Tsinghua UniversityCAS Key Laboratory of Standardization and Measurement for Nanotechnology, National Center for Nanoscience and TechnologyCAS Key Laboratory of Standardization and Measurement for Nanotechnology, National Center for Nanoscience and TechnologyState Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin UniversityState Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin UniversityState Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instrument, Tsinghua UniversityState Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin UniversityAbstract Organic semiconductor crystals (OSCs) offer mechanical flexibility, high carrier mobility, and tunable electronic structures, making them promising for optoelectronic and photonic applications. However, traditional lithographic techniques damage OSCs due to high-energy beams or solvents, leading to high defect densities, poor uniformity, and significant device-to-device variation. Existing methods also struggle to eliminate residual layers while forming independent, complex two-dimensional patterns. A chemical-free nanoimprint crystallography (NICL) method is introduced to overcome these challenges by balancing residual-layer-free nanoimprinting with the fabrication of independent, complex 2D patterns. In situ control of crystallization kinetics via temperature gradient adjustment yields OSC nanostructures with low defect densities and good uniformity. Patterning of various OSCs over a range of feature sizes is demonstrated. The patterned OSCs exhibit good lasing performance and low device-to-device variation (as low as 2%), indicating that NICL is a promising approach for fabricating high-performance, uniform OSC-based devices.https://doi.org/10.1038/s41467-025-58934-9 |
| spellingShingle | Shun-Xin Li Guan-Yao Huang Hong Xia Tairan Fu Xiao-Jie Wang Xin Zeng Xinfeng Liu Yan-Hao Yu Qi-Dai Chen Linhan Lin Hong-Bo Sun Nanoimprint crystalithography for organic semiconductors Nature Communications |
| title | Nanoimprint crystalithography for organic semiconductors |
| title_full | Nanoimprint crystalithography for organic semiconductors |
| title_fullStr | Nanoimprint crystalithography for organic semiconductors |
| title_full_unstemmed | Nanoimprint crystalithography for organic semiconductors |
| title_short | Nanoimprint crystalithography for organic semiconductors |
| title_sort | nanoimprint crystalithography for organic semiconductors |
| url | https://doi.org/10.1038/s41467-025-58934-9 |
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