Wetting behavior and interfacial reactions of Cu–20Sn–2Cr alloy on various carbon substrates
The effect of different carbon sources (CS) and the underlying mechanisms on wetting behavior, interfacial reaction products, and spreading kinetics at the reactive wetting interface between Cu-based alloys and carbon materials during brazing and composites preparation remain unclear. This study inv...
Saved in:
| Main Authors: | , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2025-05-01
|
| Series: | Journal of Materials Research and Technology |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2238785425010038 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Summary: | The effect of different carbon sources (CS) and the underlying mechanisms on wetting behavior, interfacial reaction products, and spreading kinetics at the reactive wetting interface between Cu-based alloys and carbon materials during brazing and composites preparation remain unclear. This study investigates the reactive wetting behavior of a Cu–20Sn–2Cr alloy on various carbon substrates (graphite (Cgr), polycrystalline diamond (CPD), vitreous carbon (CV), and multi-walled carbon nanotubes Bucky paper (CMW)) at 1100 °C using a modified sessile drop method. The results indicate the equilibrium contact angle (θe) of Cgr(7°), CPD(8°), and CV(11°) are close to each other, whereas the θe values of CMW-back (83°) and CMW-front (69°) are higher. The reaction product layer (RPL) in Cgr, CPD, and CV consists of a continuous and dense chromium carbides (CrmCn); the interface of CMW exhibit an “alloy + nanoscale Cr3C2 cluster'' transition zone. The spreading kinetics of Cgr, CPD and CMW are controlled diffusion of Cr atoms to the triple line (TL) front, while Cv is controlled first by the diffusion of Cr atoms to the TL front, then is controlled by the reaction between Cr and C atoms at the TL front. |
|---|---|
| ISSN: | 2238-7854 |