Hybrid Bonding With Polymeric Interlayer Dielectric Layers Patterned by Nanoimprint Lithography
Recent advancements in semiconductor technology have shifted the focus of innovation toward advanced packaging technologies featuring heterogeneous integration. Among these, hybrid bonding has garnered significant attention due to its potential for achieving higher integration density and reduced in...
Saved in:
| Main Authors: | Sungwoo Jeon, Sohwi Lee, Hyunsik Yoon |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
IEEE
2025-01-01
|
| Series: | IEEE Access |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/11087484/ |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
Pattern distortion in nanoimprint lithography using UV-curable polymer stamps
by: Fangfang Li, et al.
Published: (2024-12-01) -
An Improved Algorithm to Extract Moiré Fringe Phase for Wafer-Mask Alignment in Nanoimprint Lithography
by: Feifan Xu, et al.
Published: (2024-11-01) -
3D multi-site hydrogen evolution reaction catalysts on nanoimprinted surfaces, structured via multi-photon lithography derived masks
by: Alexander Jelinek, et al.
Published: (2025-04-01) -
Novel ultraflexible transparent self-heating composite films for nanoimprint lithography
by: Zhiwei Yang, et al.
Published: (2025-06-01) -
Grayscale Lithography and a Brief Introduction to Other Widely Used Lithographic Methods: A State-of-the-Art Review
by: Svetlana N. Khonina, et al.
Published: (2024-10-01)