Nanoporous Copper Films: How to Grow Porous Films by Magnetron Sputter Deposition
Porous copper films used in current collectors have been shown to improve the stability of Li-ion batteries. They can be applied in Si-based photodiodes, sensors or as microradiators. Their fabrication, however, remains a challenge. In this work, we report on the direct deposition of porous copper f...
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MDPI AG
2024-11-01
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| author | Michał A. Borysiewicz Patrycja Barańczyk Jakub Zawadzki Marek Wzorek Rafał Zybała Beata Synkiewicz-Musialska Paweł Krzyściak |
| author_facet | Michał A. Borysiewicz Patrycja Barańczyk Jakub Zawadzki Marek Wzorek Rafał Zybała Beata Synkiewicz-Musialska Paweł Krzyściak |
| author_sort | Michał A. Borysiewicz |
| collection | DOAJ |
| description | Porous copper films used in current collectors have been shown to improve the stability of Li-ion batteries. They can be applied in Si-based photodiodes, sensors or as microradiators. Their fabrication, however, remains a challenge. In this work, we report on the direct deposition of porous copper films using magnetron sputtering in regular chamber geometry. We show how by using appropriate process gases and substrate temperatures, it is possible to control the morphology of the deposited films. In particular, the optimization of the argon to oxygen flow ratios and flow values leads to small porosification of the deposited copper films. Further, heating the substrate during deposition enables the growth of pore sizes into mesoporous and macroporous ranges. This approach is scalable, and since it does not require glancing angle deposition enables the easy coverage of large surfaces with uniformly porous films. |
| format | Article |
| id | doaj-art-5f1359dbeccb4f54ab8beb2d9b3382b5 |
| institution | OA Journals |
| issn | 2073-4352 |
| language | English |
| publishDate | 2024-11-01 |
| publisher | MDPI AG |
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| series | Crystals |
| spelling | doaj-art-5f1359dbeccb4f54ab8beb2d9b3382b52025-08-20T02:28:12ZengMDPI AGCrystals2073-43522024-11-01141196510.3390/cryst14110965Nanoporous Copper Films: How to Grow Porous Films by Magnetron Sputter DepositionMichał A. Borysiewicz0Patrycja Barańczyk1Jakub Zawadzki2Marek Wzorek3Rafał Zybała4Beata Synkiewicz-Musialska5Paweł Krzyściak6Łukasiewicz Research Network—Institute of Microelectronics and Photonics, Al. Lotników 32/46, 02-668 Warsaw, PolandŁukasiewicz Research Network—Institute of Microelectronics and Photonics, Al. Lotników 32/46, 02-668 Warsaw, PolandŁukasiewicz Research Network—Institute of Microelectronics and Photonics, Al. Lotników 32/46, 02-668 Warsaw, PolandŁukasiewicz Research Network—Institute of Microelectronics and Photonics, Al. Lotników 32/46, 02-668 Warsaw, PolandŁukasiewicz Research Network—Institute of Microelectronics and Photonics, Al. Lotników 32/46, 02-668 Warsaw, PolandŁukasiewicz Research Network—Institute of Microelectronics and Photonics, Al. Lotników 32/46, 02-668 Warsaw, PolandDepartment of Infection Control and Mycology, Faculty of Medicine, Jagiellonian University Medical College, 31-121 Kraków, PolandPorous copper films used in current collectors have been shown to improve the stability of Li-ion batteries. They can be applied in Si-based photodiodes, sensors or as microradiators. Their fabrication, however, remains a challenge. In this work, we report on the direct deposition of porous copper films using magnetron sputtering in regular chamber geometry. We show how by using appropriate process gases and substrate temperatures, it is possible to control the morphology of the deposited films. In particular, the optimization of the argon to oxygen flow ratios and flow values leads to small porosification of the deposited copper films. Further, heating the substrate during deposition enables the growth of pore sizes into mesoporous and macroporous ranges. This approach is scalable, and since it does not require glancing angle deposition enables the easy coverage of large surfaces with uniformly porous films.https://www.mdpi.com/2073-4352/14/11/965coppernanostructuresthin filmsmagnetron sputteringporous copperporous films |
| spellingShingle | Michał A. Borysiewicz Patrycja Barańczyk Jakub Zawadzki Marek Wzorek Rafał Zybała Beata Synkiewicz-Musialska Paweł Krzyściak Nanoporous Copper Films: How to Grow Porous Films by Magnetron Sputter Deposition Crystals copper nanostructures thin films magnetron sputtering porous copper porous films |
| title | Nanoporous Copper Films: How to Grow Porous Films by Magnetron Sputter Deposition |
| title_full | Nanoporous Copper Films: How to Grow Porous Films by Magnetron Sputter Deposition |
| title_fullStr | Nanoporous Copper Films: How to Grow Porous Films by Magnetron Sputter Deposition |
| title_full_unstemmed | Nanoporous Copper Films: How to Grow Porous Films by Magnetron Sputter Deposition |
| title_short | Nanoporous Copper Films: How to Grow Porous Films by Magnetron Sputter Deposition |
| title_sort | nanoporous copper films how to grow porous films by magnetron sputter deposition |
| topic | copper nanostructures thin films magnetron sputtering porous copper porous films |
| url | https://www.mdpi.com/2073-4352/14/11/965 |
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