Optical Properties of a-SiC:H Thin Films Deposited by Magnetron Sputtering
In the present work a-SiC:H thin films were prepared using magnetron sputtering technique for different substrate temperatures from 100 °C to 290 °C. Their optical properties were studied using the ellipsometry technique. The experimental results show that the optical band gap of the films varies fr...
Saved in:
| Main Authors: | Christina Veneti, Lykourgos Magafas, Panagiota Papadopoulou |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2025-06-01
|
| Series: | Electronic Materials |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2673-3978/6/2/8 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
RF Magnetron Sputtering of Silicon Carbide and Silicon Nitride Films for Solar Cells
by: V.S. Zakhvalinskii, et al.
Published: (2014-07-01) -
Features of Structure of Magnetron Films Si3N4 and SiC
by: A.P. Kuzmenko, et al.
Published: (2013-12-01) -
Formation of SiC by Vacuum Carbidization on Porous Silicon
by: M. V. Labanok, et al.
Published: (2022-10-01) -
Formation of Silicon Carbide Films by Magnetron Sputtering of Compound Carbon-silicon Target
by: V.I. Perekrestov, et al.
Published: (2015-06-01) -
The Impact of Laser Irradiation on Thin ZrN Films Deposited by Pulsed DC Magnetron Sputtering
by: Ameena Nazneen, et al.
Published: (2024-12-01)