Computational discovery of metallic MBenes for two-dimensional semiconductor contacts approaching the quantum limit

Abstract The realization of ultralow-resistance contacts in two-dimensional semiconductors such as transition metal dichalcogenides (TMDs) is pivotal for advancing transistor scaling toward the end of technology roadmap. In this work, by means of high-throughput first-principles calculations, we ide...

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Main Authors: Meng Li, Dan Cao, Dabao Xie, Meiying Gong, Congmin Zhang, Tao You, Jing Zhou, Xiaoshuang Chen, Haibo Shu
Format: Article
Language:English
Published: Nature Portfolio 2025-05-01
Series:npj Computational Materials
Online Access:https://doi.org/10.1038/s41524-025-01640-3
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author Meng Li
Dan Cao
Dabao Xie
Meiying Gong
Congmin Zhang
Tao You
Jing Zhou
Xiaoshuang Chen
Haibo Shu
author_facet Meng Li
Dan Cao
Dabao Xie
Meiying Gong
Congmin Zhang
Tao You
Jing Zhou
Xiaoshuang Chen
Haibo Shu
author_sort Meng Li
collection DOAJ
description Abstract The realization of ultralow-resistance contacts in two-dimensional semiconductors such as transition metal dichalcogenides (TMDs) is pivotal for advancing transistor scaling toward the end of technology roadmap. In this work, by means of high-throughput first-principles calculations, we identify that highly stable two-dimensional metallic MBenes with large abundance of density of states are potential for achieving low-resistance MBene-TMD contacts at the quantum limit. We reveal that local built-in electric field at MBene-MoS2 interfaces driven by interfacial polarization enables tunable band shift of MoS2 channel, which allows for obtaining p-type Ohmic contact. The strong van der Waals interactions between MBenes and MoS2 induces a delicate balance between the Fermi-level pinning and carrier tunneling efficiency, resulting in ultralow contact resistance down to 41.6 Ω μm. The contact performance of screened Nb2BO2-MoS2 and Nb2B(OH)2-MoS2 junctions can be competed with previous records using semimetals Sb and Bi as the contacts of MoS2 devices.
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id doaj-art-5b6cc18e3b034b5ab3ef505b864d2020
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issn 2057-3960
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publishDate 2025-05-01
publisher Nature Portfolio
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series npj Computational Materials
spelling doaj-art-5b6cc18e3b034b5ab3ef505b864d20202025-08-20T02:34:07ZengNature Portfolionpj Computational Materials2057-39602025-05-0111111010.1038/s41524-025-01640-3Computational discovery of metallic MBenes for two-dimensional semiconductor contacts approaching the quantum limitMeng Li0Dan Cao1Dabao Xie2Meiying Gong3Congmin Zhang4Tao You5Jing Zhou6Xiaoshuang Chen7Haibo Shu8College of Science, China Jiliang UniversityCollege of Science, China Jiliang UniversityCollege of Optical and Electronic Technology, China Jiliang UniversityCollege of Optical and Electronic Technology, China Jiliang UniversityCollege of Optical and Electronic Technology, China Jiliang UniversityCollege of Science, China Jiliang UniversityState Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of ScienceState Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of ScienceCollege of Optical and Electronic Technology, China Jiliang UniversityAbstract The realization of ultralow-resistance contacts in two-dimensional semiconductors such as transition metal dichalcogenides (TMDs) is pivotal for advancing transistor scaling toward the end of technology roadmap. In this work, by means of high-throughput first-principles calculations, we identify that highly stable two-dimensional metallic MBenes with large abundance of density of states are potential for achieving low-resistance MBene-TMD contacts at the quantum limit. We reveal that local built-in electric field at MBene-MoS2 interfaces driven by interfacial polarization enables tunable band shift of MoS2 channel, which allows for obtaining p-type Ohmic contact. The strong van der Waals interactions between MBenes and MoS2 induces a delicate balance between the Fermi-level pinning and carrier tunneling efficiency, resulting in ultralow contact resistance down to 41.6 Ω μm. The contact performance of screened Nb2BO2-MoS2 and Nb2B(OH)2-MoS2 junctions can be competed with previous records using semimetals Sb and Bi as the contacts of MoS2 devices.https://doi.org/10.1038/s41524-025-01640-3
spellingShingle Meng Li
Dan Cao
Dabao Xie
Meiying Gong
Congmin Zhang
Tao You
Jing Zhou
Xiaoshuang Chen
Haibo Shu
Computational discovery of metallic MBenes for two-dimensional semiconductor contacts approaching the quantum limit
npj Computational Materials
title Computational discovery of metallic MBenes for two-dimensional semiconductor contacts approaching the quantum limit
title_full Computational discovery of metallic MBenes for two-dimensional semiconductor contacts approaching the quantum limit
title_fullStr Computational discovery of metallic MBenes for two-dimensional semiconductor contacts approaching the quantum limit
title_full_unstemmed Computational discovery of metallic MBenes for two-dimensional semiconductor contacts approaching the quantum limit
title_short Computational discovery of metallic MBenes for two-dimensional semiconductor contacts approaching the quantum limit
title_sort computational discovery of metallic mbenes for two dimensional semiconductor contacts approaching the quantum limit
url https://doi.org/10.1038/s41524-025-01640-3
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