$Evaluation and Characterization of High-Uniformity SiN<sub>x</sub> Thin Film with Controllable Refractive Index by Home-Made Cat-CVD Based on Orthogonal Experiments$

Evaluation and Characterization of High-Uniformity SiN<sub>x</sub> Thin Film with Controllable Refractive Index by Home-Made Cat-CVD Based on Orthogonal Experiments

Silicon nitride (SiN<sub>x</sub>) thin film is a promising coating with great physiochemical and optical properties. However, the preparation of films with good comprehensive properties still faces challenges. This study focused on developing a method for the preparation of uniform SiN&l...

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Bibliographic Details
Main Authors:	Caifang Li, Minghui Li, Jinsong Shi, Haibin Huang, Zhimei Li
Format:	Article
Language:	English
Published:	MDPI AG 2025-02-01
Series:	Molecules
Subjects:	SiN<sub>x</sub> thin film Cat-CVD orthogonal experiment refractive index
Online Access:	https://www.mdpi.com/1420-3049/30/5/1091
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