Evaluation and Characterization of High-Uniformity SiN<sub>x</sub> Thin Film with Controllable Refractive Index by Home-Made Cat-CVD Based on Orthogonal Experiments
Silicon nitride (SiN<sub>x</sub>) thin film is a promising coating with great physiochemical and optical properties. However, the preparation of films with good comprehensive properties still faces challenges. This study focused on developing a method for the preparation of uniform SiN&l...
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MDPI AG
2025-02-01
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| author | Caifang Li Minghui Li Jinsong Shi Haibin Huang Zhimei Li |
| author_facet | Caifang Li Minghui Li Jinsong Shi Haibin Huang Zhimei Li |
| author_sort | Caifang Li |
| collection | DOAJ |
| description | Silicon nitride (SiN<sub>x</sub>) thin film is a promising coating with great physiochemical and optical properties. However, the preparation of films with good comprehensive properties still faces challenges. This study focused on developing a method for the preparation of uniform SiN<sub>x</sub> thin film with a controllable refractive index using home-made catalytic chemical vapor deposition (Cat-CVD) equipment. Orthogonal experimental design was employed to investigate the effects of four key influence factors, including reaction pressure, the ratio of SiH<sub>4</sub> to NH<sub>3</sub>, the ratio of SiH<sub>4</sub> to H<sub>2</sub>, and substrate temperature. The response parameters evaluated were the refractive index, extinction coefficient, uniformity, and deposition rate of SiN<sub>x</sub> thin film. Compared with the single-factor variable tests, an orthogonal experiment could obtain the optimal preparation process of the SiN<sub>x</sub> thin film with the best comprehensive quality through the least number of experiments. At the same time, the microstructures of SiN<sub>x</sub> thin film were analyzed by various characterization methods, including Fourier-transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), and scanning electron microscopy (SEM), to research the relationship between preparation factors and the properties of SiN<sub>x</sub> thin film. This paper provides the theoretical guidance for fine-regulating the properties of SiNx thin film in practical applications. |
| format | Article |
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| institution | DOAJ |
| issn | 1420-3049 |
| language | English |
| publishDate | 2025-02-01 |
| publisher | MDPI AG |
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| spelling | doaj-art-5b1d4bc45a054ea2b3dd5395124bda5d2025-08-20T02:52:45ZengMDPI AGMolecules1420-30492025-02-01305109110.3390/molecules30051091Evaluation and Characterization of High-Uniformity SiN<sub>x</sub> Thin Film with Controllable Refractive Index by Home-Made Cat-CVD Based on Orthogonal ExperimentsCaifang Li0Minghui Li1Jinsong Shi2Haibin Huang3Zhimei Li4Key Laboratory of Jiangxi Province for Environment and Energy Catalysis, School of Chemistry and Chemical Engineering, Nanchang University, Nanchang 330031, ChinaInstitute of Applied Chemistry, Jiangxi Academy of Sciences, Nanchang 330096, ChinaInstitute of Applied Chemistry, Jiangxi Academy of Sciences, Nanchang 330096, ChinaJiangxi HAC General Semiconductor Technology Co., Ltd., Jiujiang 332020, ChinaKey Laboratory of Jiangxi Province for Environment and Energy Catalysis, School of Chemistry and Chemical Engineering, Nanchang University, Nanchang 330031, ChinaSilicon nitride (SiN<sub>x</sub>) thin film is a promising coating with great physiochemical and optical properties. However, the preparation of films with good comprehensive properties still faces challenges. This study focused on developing a method for the preparation of uniform SiN<sub>x</sub> thin film with a controllable refractive index using home-made catalytic chemical vapor deposition (Cat-CVD) equipment. Orthogonal experimental design was employed to investigate the effects of four key influence factors, including reaction pressure, the ratio of SiH<sub>4</sub> to NH<sub>3</sub>, the ratio of SiH<sub>4</sub> to H<sub>2</sub>, and substrate temperature. The response parameters evaluated were the refractive index, extinction coefficient, uniformity, and deposition rate of SiN<sub>x</sub> thin film. Compared with the single-factor variable tests, an orthogonal experiment could obtain the optimal preparation process of the SiN<sub>x</sub> thin film with the best comprehensive quality through the least number of experiments. At the same time, the microstructures of SiN<sub>x</sub> thin film were analyzed by various characterization methods, including Fourier-transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), and scanning electron microscopy (SEM), to research the relationship between preparation factors and the properties of SiN<sub>x</sub> thin film. This paper provides the theoretical guidance for fine-regulating the properties of SiNx thin film in practical applications.https://www.mdpi.com/1420-3049/30/5/1091SiN<sub>x</sub> thin filmCat-CVDorthogonal experimentrefractive index |
| spellingShingle | Caifang Li Minghui Li Jinsong Shi Haibin Huang Zhimei Li Evaluation and Characterization of High-Uniformity SiN<sub>x</sub> Thin Film with Controllable Refractive Index by Home-Made Cat-CVD Based on Orthogonal Experiments Molecules SiN<sub>x</sub> thin film Cat-CVD orthogonal experiment refractive index |
| title | Evaluation and Characterization of High-Uniformity SiN<sub>x</sub> Thin Film with Controllable Refractive Index by Home-Made Cat-CVD Based on Orthogonal Experiments |
| title_full | Evaluation and Characterization of High-Uniformity SiN<sub>x</sub> Thin Film with Controllable Refractive Index by Home-Made Cat-CVD Based on Orthogonal Experiments |
| title_fullStr | Evaluation and Characterization of High-Uniformity SiN<sub>x</sub> Thin Film with Controllable Refractive Index by Home-Made Cat-CVD Based on Orthogonal Experiments |
| title_full_unstemmed | Evaluation and Characterization of High-Uniformity SiN<sub>x</sub> Thin Film with Controllable Refractive Index by Home-Made Cat-CVD Based on Orthogonal Experiments |
| title_short | Evaluation and Characterization of High-Uniformity SiN<sub>x</sub> Thin Film with Controllable Refractive Index by Home-Made Cat-CVD Based on Orthogonal Experiments |
| title_sort | evaluation and characterization of high uniformity sin sub x sub thin film with controllable refractive index by home made cat cvd based on orthogonal experiments |
| topic | SiN<sub>x</sub> thin film Cat-CVD orthogonal experiment refractive index |
| url | https://www.mdpi.com/1420-3049/30/5/1091 |
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