Calculation of Impurity Diffusion in Siiicon

The paper contains information about analytical solutions of diffusion equation which have been obtained for the first time. An example of calculation of diffusion processes in silicon during manufacturing of semiconductor devices is considered in the paper. Mathematical functions suitable for obtai...

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Main Author: V. А. Bondarev
Format: Article
Language:Russian
Published: Belarusian National Technical University 2004-08-01
Series:Известия высших учебных заведений и энергетических объединенний СНГ: Энергетика
Online Access:https://energy.bntu.by/jour/article/view/1155
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author V. А. Bondarev
author_facet V. А. Bondarev
author_sort V. А. Bondarev
collection DOAJ
description The paper contains information about analytical solutions of diffusion equation which have been obtained for the first time. An example of calculation of diffusion processes in silicon during manufacturing of semiconductor devices is considered in the paper. Mathematical functions suitable for obtaining analytical formulae are determined with the help of a detailed analysis of physical model. Such functions make it possible to find approximations from below and above to the solution of the given problem that greatly reduces the calculation time if computer programs for three-dimensional
format Article
id doaj-art-53c6456d240e4efab3a3bc5e5dedbbde
institution Kabale University
issn 1029-7448
2414-0341
language Russian
publishDate 2004-08-01
publisher Belarusian National Technical University
record_format Article
series Известия высших учебных заведений и энергетических объединенний СНГ: Энергетика
spelling doaj-art-53c6456d240e4efab3a3bc5e5dedbbde2025-08-20T03:37:53ZrusBelarusian National Technical UniversityИзвестия высших учебных заведений и энергетических объединенний СНГ: Энергетика1029-74482414-03412004-08-0104455110.21122/1029-7448-2004-0-4-45-511114Calculation of Impurity Diffusion in SiiiconV. А. Bondarev0Belarusian National Technical UniversityThe paper contains information about analytical solutions of diffusion equation which have been obtained for the first time. An example of calculation of diffusion processes in silicon during manufacturing of semiconductor devices is considered in the paper. Mathematical functions suitable for obtaining analytical formulae are determined with the help of a detailed analysis of physical model. Such functions make it possible to find approximations from below and above to the solution of the given problem that greatly reduces the calculation time if computer programs for three-dimensionalhttps://energy.bntu.by/jour/article/view/1155
spellingShingle V. А. Bondarev
Calculation of Impurity Diffusion in Siiicon
Известия высших учебных заведений и энергетических объединенний СНГ: Энергетика
title Calculation of Impurity Diffusion in Siiicon
title_full Calculation of Impurity Diffusion in Siiicon
title_fullStr Calculation of Impurity Diffusion in Siiicon
title_full_unstemmed Calculation of Impurity Diffusion in Siiicon
title_short Calculation of Impurity Diffusion in Siiicon
title_sort calculation of impurity diffusion in siiicon
url https://energy.bntu.by/jour/article/view/1155
work_keys_str_mv AT vabondarev calculationofimpuritydiffusioninsiiicon