A universal optoelectronic imaging platform with wafer-scale integration of two-dimensional semiconductors

Photodetectors (PDs) are crucial in modern society as they enable the detection of a diverse range of light-based signals. With the exponential increase in their development, materials are being used to create a wide range of PDs that play critical roles in enabling various applications and technolo...

Full description

Saved in:
Bibliographic Details
Main Authors: Xinyu Wang, Die Wang, Yuchen Tian, Jing Guo, Jinshui Miao, Weida Hu, Hailu Wang, Kang Liu, Lei Shao, Saifei Gou, Xiangqi Dong, Hesheng Su, Chuming Sheng, Yuxuan Zhu, Zhejia Zhang, Jinshu Zhang, Qicheng Sun, Zihan Xu, Peng Zhou, Honglei Chen, Wenzhong Bao
Format: Article
Language:English
Published: Elsevier 2024-12-01
Series:Chip
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S270947232400025X
Tags: Add Tag
No Tags, Be the first to tag this record!
_version_ 1846101918482432000
author Xinyu Wang
Die Wang
Yuchen Tian
Jing Guo
Jinshui Miao
Weida Hu
Hailu Wang
Kang Liu
Lei Shao
Saifei Gou
Xiangqi Dong
Hesheng Su
Chuming Sheng
Yuxuan Zhu
Zhejia Zhang
Jinshu Zhang
Qicheng Sun
Zihan Xu
Peng Zhou
Honglei Chen
Wenzhong Bao
author_facet Xinyu Wang
Die Wang
Yuchen Tian
Jing Guo
Jinshui Miao
Weida Hu
Hailu Wang
Kang Liu
Lei Shao
Saifei Gou
Xiangqi Dong
Hesheng Su
Chuming Sheng
Yuxuan Zhu
Zhejia Zhang
Jinshu Zhang
Qicheng Sun
Zihan Xu
Peng Zhou
Honglei Chen
Wenzhong Bao
author_sort Xinyu Wang
collection DOAJ
description Photodetectors (PDs) are crucial in modern society as they enable the detection of a diverse range of light-based signals. With the exponential increase in their development, materials are being used to create a wide range of PDs that play critical roles in enabling various applications and technologies. Image sensor technology has been hindered due to the lack of a universal system that can integrate all types of PDs with silicon-based readout integrated circuits (ROICs). To address this issue, we conducted experiments adopting two-dimensional materials as an example. High-performance MoS2-/MoTe2-based PDs were fabricated in the current work and the most suitable ROICs were identified to pair with them. This established a solid foundation for further researches in the field of image sensors. We developed and implemented a versatile testing system that uses a printed circuit board to connect the PD and ROIC. After the ROIC generates the sampled signal, it is collected and processed by algorithms, which overcome device uniformity limitations and produce a high-quality image that is visible to the naked eye. This universal system can be used with a wide range of PD and ROIC types made from different materials, making it highly convenient for diverse testing applications and the development of diverse image sensor types. This robust new platform is expected to spur further innovation and advancements in this rapidly developing field.
format Article
id doaj-art-528021fea43d4df6bd87057cd4548c63
institution Kabale University
issn 2709-4723
language English
publishDate 2024-12-01
publisher Elsevier
record_format Article
series Chip
spelling doaj-art-528021fea43d4df6bd87057cd4548c632024-12-28T05:23:05ZengElsevierChip2709-47232024-12-0134100107A universal optoelectronic imaging platform with wafer-scale integration of two-dimensional semiconductorsXinyu Wang0Die Wang1Yuchen Tian2Jing Guo3Jinshui Miao4Weida Hu5Hailu Wang6Kang Liu7Lei Shao8Saifei Gou9Xiangqi Dong10Hesheng Su11Chuming Sheng12Yuxuan Zhu13Zhejia Zhang14Jinshu Zhang15Qicheng Sun16Zihan Xu17Peng Zhou18Honglei Chen19Wenzhong Bao20State Key Laboratory of Integrated Chips and Systems, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 200433, ChinaState Key Laboratory of Integrated Chips and Systems, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 200433, ChinaState Key Laboratory of Integrated Chips and Systems, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 200433, ChinaState Key Laboratory of Integrated Chips and Systems, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 200433, ChinaState Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China; Corresponding authors.State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, ChinaState Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, ChinaState Key Laboratory of Integrated Chips and Systems, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 200433, ChinaSchool of Electronic Information, Soochow University, Suzhou 215006, China; Corresponding authors.State Key Laboratory of Integrated Chips and Systems, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 200433, ChinaState Key Laboratory of Integrated Chips and Systems, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 200433, ChinaState Key Laboratory of Integrated Chips and Systems, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 200433, ChinaState Key Laboratory of Integrated Chips and Systems, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 200433, ChinaState Key Laboratory of Integrated Chips and Systems, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 200433, ChinaState Key Laboratory of Integrated Chips and Systems, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 200433, ChinaState Key Laboratory of Integrated Chips and Systems, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 200433, ChinaState Key Laboratory of Integrated Chips and Systems, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 200433, ChinaShenzhen Six Carbon Technology, Shenzhen 518055, ChinaState Key Laboratory of Integrated Chips and Systems, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 200433, China; Shaoxin Laboratory, Shaoxing 312000, ChinaState Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China; Corresponding authors.State Key Laboratory of Integrated Chips and Systems, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 200433, China; Shaoxin Laboratory, Shaoxing 312000, China; Corresponding authors.Photodetectors (PDs) are crucial in modern society as they enable the detection of a diverse range of light-based signals. With the exponential increase in their development, materials are being used to create a wide range of PDs that play critical roles in enabling various applications and technologies. Image sensor technology has been hindered due to the lack of a universal system that can integrate all types of PDs with silicon-based readout integrated circuits (ROICs). To address this issue, we conducted experiments adopting two-dimensional materials as an example. High-performance MoS2-/MoTe2-based PDs were fabricated in the current work and the most suitable ROICs were identified to pair with them. This established a solid foundation for further researches in the field of image sensors. We developed and implemented a versatile testing system that uses a printed circuit board to connect the PD and ROIC. After the ROIC generates the sampled signal, it is collected and processed by algorithms, which overcome device uniformity limitations and produce a high-quality image that is visible to the naked eye. This universal system can be used with a wide range of PD and ROIC types made from different materials, making it highly convenient for diverse testing applications and the development of diverse image sensor types. This robust new platform is expected to spur further innovation and advancements in this rapidly developing field.http://www.sciencedirect.com/science/article/pii/S270947232400025XPhotodetectorReadout integrated circuitAlgorithmImage sensor
spellingShingle Xinyu Wang
Die Wang
Yuchen Tian
Jing Guo
Jinshui Miao
Weida Hu
Hailu Wang
Kang Liu
Lei Shao
Saifei Gou
Xiangqi Dong
Hesheng Su
Chuming Sheng
Yuxuan Zhu
Zhejia Zhang
Jinshu Zhang
Qicheng Sun
Zihan Xu
Peng Zhou
Honglei Chen
Wenzhong Bao
A universal optoelectronic imaging platform with wafer-scale integration of two-dimensional semiconductors
Chip
Photodetector
Readout integrated circuit
Algorithm
Image sensor
title A universal optoelectronic imaging platform with wafer-scale integration of two-dimensional semiconductors
title_full A universal optoelectronic imaging platform with wafer-scale integration of two-dimensional semiconductors
title_fullStr A universal optoelectronic imaging platform with wafer-scale integration of two-dimensional semiconductors
title_full_unstemmed A universal optoelectronic imaging platform with wafer-scale integration of two-dimensional semiconductors
title_short A universal optoelectronic imaging platform with wafer-scale integration of two-dimensional semiconductors
title_sort universal optoelectronic imaging platform with wafer scale integration of two dimensional semiconductors
topic Photodetector
Readout integrated circuit
Algorithm
Image sensor
url http://www.sciencedirect.com/science/article/pii/S270947232400025X
work_keys_str_mv AT xinyuwang auniversaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT diewang auniversaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT yuchentian auniversaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT jingguo auniversaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT jinshuimiao auniversaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT weidahu auniversaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT hailuwang auniversaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT kangliu auniversaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT leishao auniversaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT saifeigou auniversaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT xiangqidong auniversaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT heshengsu auniversaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT chumingsheng auniversaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT yuxuanzhu auniversaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT zhejiazhang auniversaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT jinshuzhang auniversaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT qichengsun auniversaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT zihanxu auniversaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT pengzhou auniversaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT hongleichen auniversaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT wenzhongbao auniversaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT xinyuwang universaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT diewang universaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT yuchentian universaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT jingguo universaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT jinshuimiao universaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT weidahu universaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT hailuwang universaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT kangliu universaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT leishao universaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT saifeigou universaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT xiangqidong universaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT heshengsu universaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT chumingsheng universaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT yuxuanzhu universaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT zhejiazhang universaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT jinshuzhang universaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT qichengsun universaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT zihanxu universaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT pengzhou universaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT hongleichen universaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors
AT wenzhongbao universaloptoelectronicimagingplatformwithwaferscaleintegrationoftwodimensionalsemiconductors