Effect of Ar on Temperature and Flow Distribution in Monocrystalline Graphene Growth: Inert Gas Is Active

Effect of Ar on Temperature and Flow Distribution in Monocrystalline Graphene Growth: Inert Gas Is Active

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Bibliographic Details
Main Authors:	Peng Wang, Dong Wang, Chengmin Chen, Li Sun, Xue Zhang, Xing Guo, Fapeng Yu, Xiufeng Cheng, Xuejian Xie, Xian Zhao
Format:	Article
Language:	English
Published:	American Chemical Society 2024-12-01
Series:	ACS Omega
Online Access:	https://doi.org/10.1021/acsomega.4c06728
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