Temperature Influence on the Properties of Thin Si3N4 Films

Temperature Influence on the Properties of Thin Si3N4 Films

Applying Raman spectroscopy, small-angle x-ray scattering, and atomic force microscopy it were studied phase composition and surface morphology of nanoscale films Si3N4 (obtained by RF magnetron sputtering).

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Bibliographic Details
Main Authors:	V.S. Zakhvalinskii, P.V. Abakumov, A.P. Kuzmenko, A.S. Chekadanov, E.A. Piljuk, V.G. Rodriguez, I.J. Goncharov, S.V. Taran
Format:	Article
Language:	English
Published:	Sumy State University 2015-12-01
Series:	Журнал нано- та електронної фізики
Subjects:	Raman spectroscopy Small-angle x-ray scattering Atomic force microscop
Online Access:	http://jnep.sumdu.edu.ua/download/numbers/2015/4/articles/jnep_2015_V7_04052.pdf
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