Self-traceable angle standards with simplified traceability chain for dimensional metrology
Traceability is a fundamental issue for ensuring accuracy of nanometrology. A shortened traceability chain is advantageous for reducing calibration steps, thus reducing errors and raising application efficiency. A novel kind of two-dimensional grating is manufactured by atom lithography, whose pitch...
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| Format: | Article |
| Language: | English |
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IOP Publishing
2024-01-01
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| Series: | Applied Physics Express |
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| Online Access: | https://doi.org/10.35848/1882-0786/ad87a9 |
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| author | Xiao Deng Junyu Shen Yingfan Xiong Jinming Gou Zhaohui Tang Guangxu Xiao Zhijun Yin Dongbai Xue Yushu Shi Zhoumiao Shi Yuying Xie Xinbin Cheng Tongbao Li |
| author_facet | Xiao Deng Junyu Shen Yingfan Xiong Jinming Gou Zhaohui Tang Guangxu Xiao Zhijun Yin Dongbai Xue Yushu Shi Zhoumiao Shi Yuying Xie Xinbin Cheng Tongbao Li |
| author_sort | Xiao Deng |
| collection | DOAJ |
| description | Traceability is a fundamental issue for ensuring accuracy of nanometrology. A shortened traceability chain is advantageous for reducing calibration steps, thus reducing errors and raising application efficiency. A novel kind of two-dimensional grating is manufactured by atom lithography, whose pitch and (orthogonal) angle values are directly determined by natural constants, offering a feasible approach for effectively shortening the traceability chain. The PTB’s calibration results show that the two-dimensional grating has excellent orthogonality with a deviation of only 0.001°. The application of two-dimensional grating is demonstrated for the characterization of the angular distortion of a SEM, showing its great application potential. |
| format | Article |
| id | doaj-art-4be9b1bab3f349e481b036d8cfb03574 |
| institution | OA Journals |
| issn | 1882-0786 |
| language | English |
| publishDate | 2024-01-01 |
| publisher | IOP Publishing |
| record_format | Article |
| series | Applied Physics Express |
| spelling | doaj-art-4be9b1bab3f349e481b036d8cfb035742025-08-20T02:14:20ZengIOP PublishingApplied Physics Express1882-07862024-01-01171111500110.35848/1882-0786/ad87a9Self-traceable angle standards with simplified traceability chain for dimensional metrologyXiao Deng0Junyu Shen1Yingfan Xiong2Jinming Gou3Zhaohui Tang4Guangxu Xiao5Zhijun Yin6Dongbai Xue7Yushu Shi8Zhoumiao Shi9Yuying Xie10Xinbin Cheng11Tongbao Li12National Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University , Shanghai 200092, People’s Republic of China; Institute of Precision Optical Engineering, Tongji University , Shanghai 200092, People’s Republic of China; MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Frontiers Science Center of Digital Optics, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University , Shanghai 200092, People’s Republic of China; School of Physics Science and Engineering, Tongji University , Shanghai 200092, People’s Republic of ChinaNational Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University , Shanghai 200092, People’s Republic of China; Institute of Precision Optical Engineering, Tongji University , Shanghai 200092, People’s Republic of China; MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Frontiers Science Center of Digital Optics, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University , Shanghai 200092, People’s Republic of China; School of Physics Science and Engineering, Tongji University , Shanghai 200092, People’s Republic of ChinaNational Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University , Shanghai 200092, People’s Republic of China; Institute of Precision Optical Engineering, Tongji University , Shanghai 200092, People’s Republic of China; MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Frontiers Science Center of Digital Optics, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University , Shanghai 200092, People’s Republic of China; School of Physics Science and Engineering, Tongji University , Shanghai 200092, People’s Republic of ChinaNational Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University , Shanghai 200092, People’s Republic of China; Institute of Precision Optical Engineering, Tongji University , Shanghai 200092, People’s Republic of China; MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Frontiers Science Center of Digital Optics, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University , Shanghai 200092, People’s Republic of China; School of Physics Science and Engineering, Tongji University , Shanghai 200092, People’s Republic of ChinaNational Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University , Shanghai 200092, People’s Republic of China; Institute of Precision Optical Engineering, Tongji University , Shanghai 200092, People’s Republic of China; MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Frontiers Science Center of Digital Optics, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University , Shanghai 200092, People’s Republic of China; School of Physics Science and Engineering, Tongji University , Shanghai 200092, People’s Republic of ChinaNational Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University , Shanghai 200092, People’s Republic of China; Institute of Precision Optical Engineering, Tongji University , Shanghai 200092, People’s Republic of China; MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Frontiers Science Center of Digital Optics, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University , Shanghai 200092, People’s Republic of China; School of Physics Science and Engineering, Tongji University , Shanghai 200092, People’s Republic of ChinaNational Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University , Shanghai 200092, People’s Republic of China; Institute of Precision Optical Engineering, Tongji University , Shanghai 200092, People’s Republic of China; MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Frontiers Science Center of Digital Optics, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University , Shanghai 200092, People’s Republic of China; School of Physics Science and Engineering, Tongji University , Shanghai 200092, People’s Republic of ChinaNational Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University , Shanghai 200092, People’s Republic of China; Institute of Precision Optical Engineering, Tongji University , Shanghai 200092, People’s Republic of China; MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Frontiers Science Center of Digital Optics, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University , Shanghai 200092, People’s Republic of China; School of Physics Science and Engineering, Tongji University , Shanghai 200092, People’s Republic of ChinaNational Institute of Metrology, Beijing 100029, People’s Republic of China; Shenzhen Institute for Technology Innovation, National Institute of Metrology, Shenzhen 518107, People’s Republic of ChinaShenzhen Institute for Technology Innovation, National Institute of Metrology, Shenzhen 518107, People’s Republic of ChinaNational Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University , Shanghai 200092, People’s Republic of China; Institute of Precision Optical Engineering, Tongji University , Shanghai 200092, People’s Republic of China; MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Frontiers Science Center of Digital Optics, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University , Shanghai 200092, People’s Republic of China; School of Physics Science and Engineering, Tongji University , Shanghai 200092, People’s Republic of ChinaNational Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University , Shanghai 200092, People’s Republic of China; Institute of Precision Optical Engineering, Tongji University , Shanghai 200092, People’s Republic of China; MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Frontiers Science Center of Digital Optics, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University , Shanghai 200092, People’s Republic of China; School of Physics Science and Engineering, Tongji University , Shanghai 200092, People’s Republic of ChinaNational Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University , Shanghai 200092, People’s Republic of China; Institute of Precision Optical Engineering, Tongji University , Shanghai 200092, People’s Republic of China; MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Frontiers Science Center of Digital Optics, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University , Shanghai 200092, People’s Republic of China; School of Physics Science and Engineering, Tongji University , Shanghai 200092, People’s Republic of ChinaTraceability is a fundamental issue for ensuring accuracy of nanometrology. A shortened traceability chain is advantageous for reducing calibration steps, thus reducing errors and raising application efficiency. A novel kind of two-dimensional grating is manufactured by atom lithography, whose pitch and (orthogonal) angle values are directly determined by natural constants, offering a feasible approach for effectively shortening the traceability chain. The PTB’s calibration results show that the two-dimensional grating has excellent orthogonality with a deviation of only 0.001°. The application of two-dimensional grating is demonstrated for the characterization of the angular distortion of a SEM, showing its great application potential.https://doi.org/10.35848/1882-0786/ad87a9dimensional metrologyshortened angle traceability chainatom lithography2D self-traceable gratingSEM calibration |
| spellingShingle | Xiao Deng Junyu Shen Yingfan Xiong Jinming Gou Zhaohui Tang Guangxu Xiao Zhijun Yin Dongbai Xue Yushu Shi Zhoumiao Shi Yuying Xie Xinbin Cheng Tongbao Li Self-traceable angle standards with simplified traceability chain for dimensional metrology Applied Physics Express dimensional metrology shortened angle traceability chain atom lithography 2D self-traceable grating SEM calibration |
| title | Self-traceable angle standards with simplified traceability chain for dimensional metrology |
| title_full | Self-traceable angle standards with simplified traceability chain for dimensional metrology |
| title_fullStr | Self-traceable angle standards with simplified traceability chain for dimensional metrology |
| title_full_unstemmed | Self-traceable angle standards with simplified traceability chain for dimensional metrology |
| title_short | Self-traceable angle standards with simplified traceability chain for dimensional metrology |
| title_sort | self traceable angle standards with simplified traceability chain for dimensional metrology |
| topic | dimensional metrology shortened angle traceability chain atom lithography 2D self-traceable grating SEM calibration |
| url | https://doi.org/10.35848/1882-0786/ad87a9 |
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