1,550-nm photonic crystal surface-emitting laser diode fabricated by single deep air-hole etch
Photonic crystal surface-emitting lasers (PCSELs) are promising light sources with numerous advantages, including vertical emission, single-mode operation, and high output power. However, the fabrication of PCSEL devices requires advanced techniques, such as wafer bonding or epitaxial regrowth, to f...
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| Format: | Article |
| Language: | English |
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De Gruyter
2025-02-01
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| Series: | Nanophotonics |
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| Online Access: | https://doi.org/10.1515/nanoph-2024-0760 |
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| author | Kim Myeongeun Song Ye-Seong Jeong Lakjong Lee Tae-Yun Choi Hyo Seok Kim In Lee Myungjae Jeon Heonsu |
| author_facet | Kim Myeongeun Song Ye-Seong Jeong Lakjong Lee Tae-Yun Choi Hyo Seok Kim In Lee Myungjae Jeon Heonsu |
| author_sort | Kim Myeongeun |
| collection | DOAJ |
| description | Photonic crystal surface-emitting lasers (PCSELs) are promising light sources with numerous advantages, including vertical emission, single-mode operation, and high output power. However, the fabrication of PCSEL devices requires advanced techniques, such as wafer bonding or epitaxial regrowth, to form a photonic crystal (PhC) structure close to the central waveguide layer. This process is not only complicated but also necessitates multiple semiconductor epitaxies, which reduces fabrication yield and increases manufacturing costs. In this study, we introduce a simpler method for fabricating PCSELs that requires only a single dry-etch run on any standard edge-emitting laser diode epistructure. The key challenge of creating an array of PhC air holes deep enough to reach the waveguide layer is addressed through high-temperature, high-plasma-density dry etching. PCSEL devices fabricated using this method lased in single mode at a threshold current density as low as ∼0.8 kA/cm2, which is comparable to or better than previously demonstrated devices. Our results offer a cost-effective, high-yield approach to PCSEL fabrication. |
| format | Article |
| id | doaj-art-4bbc6e73fb5746a29ebe00a0487178ab |
| institution | DOAJ |
| issn | 2192-8614 |
| language | English |
| publishDate | 2025-02-01 |
| publisher | De Gruyter |
| record_format | Article |
| series | Nanophotonics |
| spelling | doaj-art-4bbc6e73fb5746a29ebe00a0487178ab2025-08-20T02:55:56ZengDe GruyterNanophotonics2192-86142025-02-0114451552210.1515/nanoph-2024-07601,550-nm photonic crystal surface-emitting laser diode fabricated by single deep air-hole etchKim Myeongeun0Song Ye-Seong1Jeong Lakjong2Lee Tae-Yun3Choi Hyo Seok4Kim In5Lee Myungjae6Jeon Heonsu7Department of Physics and Astronomy, 26725Seoul National University, Seoul08826, Republic of KoreaDepartment of Physics and Astronomy, 26725Seoul National University, Seoul08826, Republic of KoreaDepartment of Physics and Astronomy, 26725Seoul National University, Seoul08826, Republic of KoreaDepartment of Physics and Astronomy, 26725Seoul National University, Seoul08826, Republic of KoreaOE Solutions, Gwangju61080, Republic of KoreaOE Solutions, Gwangju61080, Republic of KoreaInter-University Semiconductor Research Centre, 26725Seoul National University, Seoul08826, Republic of KoreaDepartment of Physics and Astronomy, 26725Seoul National University, Seoul08826, Republic of KoreaPhotonic crystal surface-emitting lasers (PCSELs) are promising light sources with numerous advantages, including vertical emission, single-mode operation, and high output power. However, the fabrication of PCSEL devices requires advanced techniques, such as wafer bonding or epitaxial regrowth, to form a photonic crystal (PhC) structure close to the central waveguide layer. This process is not only complicated but also necessitates multiple semiconductor epitaxies, which reduces fabrication yield and increases manufacturing costs. In this study, we introduce a simpler method for fabricating PCSELs that requires only a single dry-etch run on any standard edge-emitting laser diode epistructure. The key challenge of creating an array of PhC air holes deep enough to reach the waveguide layer is addressed through high-temperature, high-plasma-density dry etching. PCSEL devices fabricated using this method lased in single mode at a threshold current density as low as ∼0.8 kA/cm2, which is comparable to or better than previously demonstrated devices. Our results offer a cost-effective, high-yield approach to PCSEL fabrication.https://doi.org/10.1515/nanoph-2024-0760photonic crystalsurface-emitting laserlaser diodeband-edge modedeep air holedry-etch |
| spellingShingle | Kim Myeongeun Song Ye-Seong Jeong Lakjong Lee Tae-Yun Choi Hyo Seok Kim In Lee Myungjae Jeon Heonsu 1,550-nm photonic crystal surface-emitting laser diode fabricated by single deep air-hole etch Nanophotonics photonic crystal surface-emitting laser laser diode band-edge mode deep air hole dry-etch |
| title | 1,550-nm photonic crystal surface-emitting laser diode fabricated by single deep air-hole etch |
| title_full | 1,550-nm photonic crystal surface-emitting laser diode fabricated by single deep air-hole etch |
| title_fullStr | 1,550-nm photonic crystal surface-emitting laser diode fabricated by single deep air-hole etch |
| title_full_unstemmed | 1,550-nm photonic crystal surface-emitting laser diode fabricated by single deep air-hole etch |
| title_short | 1,550-nm photonic crystal surface-emitting laser diode fabricated by single deep air-hole etch |
| title_sort | 1 550 nm photonic crystal surface emitting laser diode fabricated by single deep air hole etch |
| topic | photonic crystal surface-emitting laser laser diode band-edge mode deep air hole dry-etch |
| url | https://doi.org/10.1515/nanoph-2024-0760 |
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