Photo‐Thermal Approaches on Polyimide Film for Demonstration of Sub‐50 µm Polymer Stencil Mask
Abstract Stencil masks are widely utilized in traditional macro‐scale patterning due to their simplicity and versatility in enabling various types of patterns. Compared to photoresist‐based methods, stencil‐based patterning enables chemical‐free processing and curved surface application. However, th...
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| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Wiley-VCH
2025-07-01
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| Series: | Advanced Electronic Materials |
| Subjects: | |
| Online Access: | https://doi.org/10.1002/aelm.202400979 |
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