Coupling and Shielding Properties of the Baffle in ICP System
This contribution is dealing with experimental and computational evaluation of the deposition baffle that is transparent to radio frequency (RF) magnetic fields generated by an external antenna in an inductively coupled plasma (ICP) source but opaque to the deposition of the metal onto a dielectric...
Saved in:
| Main Authors: | , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Wiley
2011-01-01
|
| Series: | Modelling and Simulation in Engineering |
| Online Access: | http://dx.doi.org/10.1155/2011/541743 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| _version_ | 1832550691003957248 |
|---|---|
| author | Jozef Brcka R. Lee Robison |
| author_facet | Jozef Brcka R. Lee Robison |
| author_sort | Jozef Brcka |
| collection | DOAJ |
| description | This contribution is dealing with experimental and computational evaluation of the deposition baffle that is transparent to radio frequency (RF) magnetic fields generated by an external antenna in an inductively coupled plasma (ICP) source but opaque to the deposition of the metal onto a dielectric wall in ionized physical vapor deposition (IPVD) system. Various engineering aspects related to the deposition baffle are discussed. Among the many requirements focus is on specific structure of the slots and analysis to minimize deposition on the baffle (we used a string model for simulating the profile evolution) and deposition through the DB on dielectric components of the ICP source. Transparency of the baffle to RF magnetic fields is computed using a three-dimensional (3D) electromagnetic field solver. A simple two-dimensional sheath model is used to understand plasma interactions with the DB slot structure. Performance and possible failure of device are briefly discussed. |
| format | Article |
| id | doaj-art-49086426371a43d7912d1739c0f72463 |
| institution | Kabale University |
| issn | 1687-5591 1687-5605 |
| language | English |
| publishDate | 2011-01-01 |
| publisher | Wiley |
| record_format | Article |
| series | Modelling and Simulation in Engineering |
| spelling | doaj-art-49086426371a43d7912d1739c0f724632025-02-03T06:06:00ZengWileyModelling and Simulation in Engineering1687-55911687-56052011-01-01201110.1155/2011/541743541743Coupling and Shielding Properties of the Baffle in ICP SystemJozef Brcka0R. Lee Robison1Technology Development Center, TEL US Holdings Inc., Suite 244, 255 Fuller Road, Albany, NY 12203, USATEL Technology Center America LLC, Suite 244, 255 Fuller Road, Albany, NY 12203, USAThis contribution is dealing with experimental and computational evaluation of the deposition baffle that is transparent to radio frequency (RF) magnetic fields generated by an external antenna in an inductively coupled plasma (ICP) source but opaque to the deposition of the metal onto a dielectric wall in ionized physical vapor deposition (IPVD) system. Various engineering aspects related to the deposition baffle are discussed. Among the many requirements focus is on specific structure of the slots and analysis to minimize deposition on the baffle (we used a string model for simulating the profile evolution) and deposition through the DB on dielectric components of the ICP source. Transparency of the baffle to RF magnetic fields is computed using a three-dimensional (3D) electromagnetic field solver. A simple two-dimensional sheath model is used to understand plasma interactions with the DB slot structure. Performance and possible failure of device are briefly discussed.http://dx.doi.org/10.1155/2011/541743 |
| spellingShingle | Jozef Brcka R. Lee Robison Coupling and Shielding Properties of the Baffle in ICP System Modelling and Simulation in Engineering |
| title | Coupling and Shielding Properties of the Baffle in ICP System |
| title_full | Coupling and Shielding Properties of the Baffle in ICP System |
| title_fullStr | Coupling and Shielding Properties of the Baffle in ICP System |
| title_full_unstemmed | Coupling and Shielding Properties of the Baffle in ICP System |
| title_short | Coupling and Shielding Properties of the Baffle in ICP System |
| title_sort | coupling and shielding properties of the baffle in icp system |
| url | http://dx.doi.org/10.1155/2011/541743 |
| work_keys_str_mv | AT jozefbrcka couplingandshieldingpropertiesofthebaffleinicpsystem AT rleerobison couplingandshieldingpropertiesofthebaffleinicpsystem |