Inhibition of photosystem Ⅱ enhances the N-mediated resistance but attenuates tobacco nonhost resistance

Influence of light through photosynthesis-mediated pathway on plant gene-for-gene resistance and nonhost resistance was studied, employing the herbicide diuron as inhibitor of photosystem Ⅱ which is involved in electron transport during photosynthesis, the tobacco F1 progeny carrying the R/Avr compl...

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Bibliographic Details
Main Authors: HE Wei-hua, CAI Xin-zhong, ZHANG Zhi-xin
Format: Article
Language:English
Published: Zhejiang University Press 2006-11-01
Series:浙江大学学报. 农业与生命科学版
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Online Access:https://www.academax.com/doi/10.3785/1008-9209.2006.06.0628
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Summary:Influence of light through photosynthesis-mediated pathway on plant gene-for-gene resistance and nonhost resistance was studied, employing the herbicide diuron as inhibitor of photosystem Ⅱ which is involved in electron transport during photosynthesis, the tobacco F1 progeny carrying the R/Avr complementary gene pair N/P50 as materials of study on plant gene-for-gene resistance, and Colletotrichum adlay isolate and its nonhost tobacco as interaction system of study on plant nonhost resistance. It was found that treatment with 23.3 mg·L<sup>-1</sup> diuron speeded up the N-mediated hypersensitive response in the N/P50 tobacco. The original tobacco nonpathogen Colletotrichum adlay isolate successfully infected 23.3 mg·L<sup>-1</sup> diuron-treated tobacco plants, resulting in lesions mimicking typical anthracnose disease symptom. However, expansion of the lesions was limited, and no significant amount of spores formed. Thus, the photosystem Ⅱ-mediated pathway attenuated the N-mediated resistance but enhanced tobacco nonhost resistance to Colletotrichum adlay isolate. These data demonstrate that the photosystem Ⅱ-mediated pathway influences a variety of types of plant disease resistance by a different way.
ISSN:1008-9209
2097-5155