APA (7th ed.) Citation

Yu, B., Genchi, S., Watanabe, K., Taniguchi, T., & Tanaka, H. Strain-free thin film growth of vanadium dioxide deposited on 2D atomic layered material of hexagonal boron nitride investigated by their thickness dependence of insulator–metal transition behavior. IOP Publishing.

Chicago Style (17th ed.) Citation

Yu, Boyuan, Shingo Genchi, Kenji Watanabe, Takashi Taniguchi, and Hidekazu Tanaka. Strain-free Thin Film Growth of Vanadium Dioxide Deposited on 2D Atomic Layered Material of Hexagonal Boron Nitride Investigated by Their Thickness Dependence of Insulator–metal Transition Behavior. IOP Publishing.

MLA (9th ed.) Citation

Yu, Boyuan, et al. Strain-free Thin Film Growth of Vanadium Dioxide Deposited on 2D Atomic Layered Material of Hexagonal Boron Nitride Investigated by Their Thickness Dependence of Insulator–metal Transition Behavior. IOP Publishing.