Thermal stability of FeSi as barrier layer in high-performance Mg2Si0.3Sn0.7 thermoelectric device
Thermal stability of thermoelectric devices plays a pivotal role in their practical applications. Chemical reaction/diffusion between thermoelectric materials and electrodes is one of the primary factors contributing to the degradation/failure of device performance at elevated temperatures. Introduc...
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| Main Authors: | Shanshan Hu, Chen Huang, Changyuan Li, Long Yang, Zhiwei Chen, Baisheng Sa, Wen Li, Yanzhong Pei |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2025-09-01
|
| Series: | Journal of Materiomics |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2352847825000346 |
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