Surface Characteristics and Performance Optimization of W-Doped Vanadium Dioxide Thin Films
This study explores the surface characteristics evaluation and performance optimization of tungsten (W)-doped vanadium dioxide (VO<sub>2</sub>) thin films. W-doped vanadium dioxide films were deposited on B270 glass substrates using an electron beam evaporation technique combined with th...
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| Format: | Article |
| Language: | English |
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MDPI AG
2024-12-01
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| Series: | Surfaces |
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| Online Access: | https://www.mdpi.com/2571-9637/7/4/73 |
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| author | Chuen-Lin Tien Chun-Yu Chiang Jia-Kai Tien Ching-Chiun Wang Shih-Chin Lin |
| author_facet | Chuen-Lin Tien Chun-Yu Chiang Jia-Kai Tien Ching-Chiun Wang Shih-Chin Lin |
| author_sort | Chuen-Lin Tien |
| collection | DOAJ |
| description | This study explores the surface characteristics evaluation and performance optimization of tungsten (W)-doped vanadium dioxide (VO<sub>2</sub>) thin films. W-doped vanadium dioxide films were deposited on B270 glass substrates using an electron beam evaporation technique combined with the ion beam-assisted deposition (IAD) method. The Taguchi method was used to analyze the performance optimization of VO<sub>2</sub> thin films, and L<sub>16</sub> orthogonal array design and Minitab software were used for optimization calculations. The surface roughness, visible light transmittance, infrared transmittance, and residual stress of un-doped and tungsten-doped (3–5%) VO<sub>2</sub> thin films are set as the quality performance indicators of thin films. The goal is to identify the key factors that affect the performance of VO<sub>2</sub> thin films during deposition and optimize their process parameters. The experimental results showed that a VO<sub>2</sub> thin film with 3% tungsten doping, an oxygen flow rate of 60 sccm, a heating temperature of 280 °C, and a film thickness of 60 nm exhibited the lowest surface roughness of 2.12 nm. A VO<sub>2</sub> thin film with 5% tungsten doping, an oxygen flow rate of 0 sccm, a heating temperature of 280 °C, and a film thickness of 60 nm had the highest visible light transmittance at 64.33%. When the oxygen flow rate was 60 sccm, the heating temperature was 295 °C, the film thickness was 150 nm, and the tungsten doping was 5%, the VO<sub>2</sub> thin film showed the lowest infrared transmittance of 31.34%. A thin film with 5% tungsten doping, an oxygen flow rate of 20 sccm, a heating temperature of 265 °C, and a film thickness of 120 nm exhibited the lowest residual stress of −0.195 GPa. |
| format | Article |
| id | doaj-art-3f7bfa3c8f4c4f3bac26b885abdeaa34 |
| institution | DOAJ |
| issn | 2571-9637 |
| language | English |
| publishDate | 2024-12-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Surfaces |
| spelling | doaj-art-3f7bfa3c8f4c4f3bac26b885abdeaa342025-08-20T02:57:01ZengMDPI AGSurfaces2571-96372024-12-01741109112410.3390/surfaces7040073Surface Characteristics and Performance Optimization of W-Doped Vanadium Dioxide Thin FilmsChuen-Lin Tien0Chun-Yu Chiang1Jia-Kai Tien2Ching-Chiun Wang3Shih-Chin Lin4Department of Electrical Engineering, Feng Chia University, Taichung 40724, TaiwanPh.D. Program of Electrical and Communications Engineering, Feng Chia University, Taichung 40724, TaiwanGraduate Institute of Library & Information Science, National Chung Hsing University, Taichung 402202, TaiwanMechanical and Systems Research Lab, Industrial Technology Research Institute, Hsinchu 310401, TaiwanMechanical and Systems Research Lab, Industrial Technology Research Institute, Hsinchu 310401, TaiwanThis study explores the surface characteristics evaluation and performance optimization of tungsten (W)-doped vanadium dioxide (VO<sub>2</sub>) thin films. W-doped vanadium dioxide films were deposited on B270 glass substrates using an electron beam evaporation technique combined with the ion beam-assisted deposition (IAD) method. The Taguchi method was used to analyze the performance optimization of VO<sub>2</sub> thin films, and L<sub>16</sub> orthogonal array design and Minitab software were used for optimization calculations. The surface roughness, visible light transmittance, infrared transmittance, and residual stress of un-doped and tungsten-doped (3–5%) VO<sub>2</sub> thin films are set as the quality performance indicators of thin films. The goal is to identify the key factors that affect the performance of VO<sub>2</sub> thin films during deposition and optimize their process parameters. The experimental results showed that a VO<sub>2</sub> thin film with 3% tungsten doping, an oxygen flow rate of 60 sccm, a heating temperature of 280 °C, and a film thickness of 60 nm exhibited the lowest surface roughness of 2.12 nm. A VO<sub>2</sub> thin film with 5% tungsten doping, an oxygen flow rate of 0 sccm, a heating temperature of 280 °C, and a film thickness of 60 nm had the highest visible light transmittance at 64.33%. When the oxygen flow rate was 60 sccm, the heating temperature was 295 °C, the film thickness was 150 nm, and the tungsten doping was 5%, the VO<sub>2</sub> thin film showed the lowest infrared transmittance of 31.34%. A thin film with 5% tungsten doping, an oxygen flow rate of 20 sccm, a heating temperature of 265 °C, and a film thickness of 120 nm exhibited the lowest residual stress of −0.195 GPa.https://www.mdpi.com/2571-9637/7/4/73vanadium dioxidethin filmTaguchi methodsurface roughnessresidual stress |
| spellingShingle | Chuen-Lin Tien Chun-Yu Chiang Jia-Kai Tien Ching-Chiun Wang Shih-Chin Lin Surface Characteristics and Performance Optimization of W-Doped Vanadium Dioxide Thin Films Surfaces vanadium dioxide thin film Taguchi method surface roughness residual stress |
| title | Surface Characteristics and Performance Optimization of W-Doped Vanadium Dioxide Thin Films |
| title_full | Surface Characteristics and Performance Optimization of W-Doped Vanadium Dioxide Thin Films |
| title_fullStr | Surface Characteristics and Performance Optimization of W-Doped Vanadium Dioxide Thin Films |
| title_full_unstemmed | Surface Characteristics and Performance Optimization of W-Doped Vanadium Dioxide Thin Films |
| title_short | Surface Characteristics and Performance Optimization of W-Doped Vanadium Dioxide Thin Films |
| title_sort | surface characteristics and performance optimization of w doped vanadium dioxide thin films |
| topic | vanadium dioxide thin film Taguchi method surface roughness residual stress |
| url | https://www.mdpi.com/2571-9637/7/4/73 |
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