An In Situ Automated System for Real-Time Monitoring of Failures in Large-Scale Field Emitter Arrays
Nano-scale vacuum transistors (NVCTs) based on field emission have the potential to operate at high frequencies and withstand harsh environments, such as radiation, high temperatures, and high power. However, they have demonstrated instability and failures over time. To achieve high currents from NV...
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MDPI AG
2024-10-01
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| Online Access: | https://www.mdpi.com/2410-390X/8/4/44 |
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| author | Reza Farsad Asadi Tao Zheng Menglin Wang Han Gao Kenneth Sangston Bruce Gnade |
| author_facet | Reza Farsad Asadi Tao Zheng Menglin Wang Han Gao Kenneth Sangston Bruce Gnade |
| author_sort | Reza Farsad Asadi |
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| description | Nano-scale vacuum transistors (NVCTs) based on field emission have the potential to operate at high frequencies and withstand harsh environments, such as radiation, high temperatures, and high power. However, they have demonstrated instability and failures over time. To achieve high currents from NVCTs, these devices are typically fabricated in large-scale arrays known as field emitter arrays (FEAs), which share a common gate, cathode, and anode. Consequently, the measured currents come from the entire array, providing limited information about the emission characteristics of individual tips. Arrays can exhibit nonuniform emission behavior across the emitting area. A phosphor screen can be used to monitor the emission pattern of the array. Additionally, visible damage can occur on the surface of the FEAs, potentially leading to the destruction of the gate and emitters, causing catastrophic failure of the FEAs. To monitor damage while operating the device, an ITO-coated glass anode, which is electrically conductive and visible-light-transparent, can be used. In this work, a method was developed to automatically monitor the emission pattern of the emitters and the changes in surface morphology while operating the devices and collecting electrical data, providing real-time information on the failure sequence of the FEAs. |
| format | Article |
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| institution | OA Journals |
| issn | 2410-390X |
| language | English |
| publishDate | 2024-10-01 |
| publisher | MDPI AG |
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| series | Instruments |
| spelling | doaj-art-3f5f56e77f4745db86593a5397f3c2da2025-08-20T02:00:28ZengMDPI AGInstruments2410-390X2024-10-01844410.3390/instruments8040044An In Situ Automated System for Real-Time Monitoring of Failures in Large-Scale Field Emitter ArraysReza Farsad Asadi0Tao Zheng1Menglin Wang2Han Gao3Kenneth Sangston4Bruce Gnade5Department of Electrical and Computer Engineering, Southern Methodist University, Dallas, TX 75205, USACoherent Corp., Sherman, TX 75092, USADepartment of Electrical and Computer Engineering, Southern Methodist University, Dallas, TX 75205, USADepartment of Electrical and Computer Engineering, Southern Methodist University, Dallas, TX 75205, USADepartment of Mechanical Engineering, Southern Methodist University, Dallas, TX 75205, USADepartment of Material Science and Engineering, University of Texas at Dallas, Richardson, TX 75080, USANano-scale vacuum transistors (NVCTs) based on field emission have the potential to operate at high frequencies and withstand harsh environments, such as radiation, high temperatures, and high power. However, they have demonstrated instability and failures over time. To achieve high currents from NVCTs, these devices are typically fabricated in large-scale arrays known as field emitter arrays (FEAs), which share a common gate, cathode, and anode. Consequently, the measured currents come from the entire array, providing limited information about the emission characteristics of individual tips. Arrays can exhibit nonuniform emission behavior across the emitting area. A phosphor screen can be used to monitor the emission pattern of the array. Additionally, visible damage can occur on the surface of the FEAs, potentially leading to the destruction of the gate and emitters, causing catastrophic failure of the FEAs. To monitor damage while operating the device, an ITO-coated glass anode, which is electrically conductive and visible-light-transparent, can be used. In this work, a method was developed to automatically monitor the emission pattern of the emitters and the changes in surface morphology while operating the devices and collecting electrical data, providing real-time information on the failure sequence of the FEAs.https://www.mdpi.com/2410-390X/8/4/44field emitter arrays (FEAs)vacuum nanoelectronicsfailure analysisemission patternultrahigh vacuum (UHV)ITO |
| spellingShingle | Reza Farsad Asadi Tao Zheng Menglin Wang Han Gao Kenneth Sangston Bruce Gnade An In Situ Automated System for Real-Time Monitoring of Failures in Large-Scale Field Emitter Arrays Instruments field emitter arrays (FEAs) vacuum nanoelectronics failure analysis emission pattern ultrahigh vacuum (UHV) ITO |
| title | An In Situ Automated System for Real-Time Monitoring of Failures in Large-Scale Field Emitter Arrays |
| title_full | An In Situ Automated System for Real-Time Monitoring of Failures in Large-Scale Field Emitter Arrays |
| title_fullStr | An In Situ Automated System for Real-Time Monitoring of Failures in Large-Scale Field Emitter Arrays |
| title_full_unstemmed | An In Situ Automated System for Real-Time Monitoring of Failures in Large-Scale Field Emitter Arrays |
| title_short | An In Situ Automated System for Real-Time Monitoring of Failures in Large-Scale Field Emitter Arrays |
| title_sort | in situ automated system for real time monitoring of failures in large scale field emitter arrays |
| topic | field emitter arrays (FEAs) vacuum nanoelectronics failure analysis emission pattern ultrahigh vacuum (UHV) ITO |
| url | https://www.mdpi.com/2410-390X/8/4/44 |
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