Shin, S. J., Kim, H., Byun, S., Shin, J., Choi, J., Lee, S. H., . . . Hwang, C. S. Influence of deposition temperature and precursor chemistry on the properties of atomic layer deposited Hf0.5Zr0.5O2 thin films. Elsevier.
Chicago Style (17th ed.) CitationShin, Seong Jae, et al. Influence of Deposition Temperature and Precursor Chemistry on the Properties of Atomic Layer Deposited Hf0.5Zr0.5O2 Thin Films. Elsevier.
MLA (9th ed.) CitationShin, Seong Jae, et al. Influence of Deposition Temperature and Precursor Chemistry on the Properties of Atomic Layer Deposited Hf0.5Zr0.5O2 Thin Films. Elsevier.
Warning: These citations may not always be 100% accurate.