Structure of TiAlN Reactive Sputtered Coatings

The Raman spectra, X-ray diffraction and hardness of the TiAlN films co-deposited on the steel substrates by reactive sputtering from Ti and Al targets in a mixture of N2 + Ar gas with two magnetrons at room temperature have been studied. From Raman spectra it is found that the position of high-freq...

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Main Authors: D. Philippon, V. Godinho, V.D.  Blank, A.S. Useinov, K.V. Gogolinsky, A.N. Kirichenko, S.N. Polyakov, B.N. Mavrin, E.A. Vinogradov, V.N. Denisov, A. Fernandez
Format: Article
Language:English
Published: Sumy State University 2012-03-01
Series:Журнал нано- та електронної фізики
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Online Access:http://jnep.sumdu.edu.ua/download/numbers/2012/1/articles/jnep_2012_V4_01021.pdf
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Summary:The Raman spectra, X-ray diffraction and hardness of the TiAlN films co-deposited on the steel substrates by reactive sputtering from Ti and Al targets in a mixture of N2 + Ar gas with two magnetrons at room temperature have been studied. From Raman spectra it is found that the position of high-frequency bands in vibrational spectra was located at 700-730 cm1 or in the region of 830  850 cm1 depending on the deposition parameters whereas it is not exceed 630 cm1 from TiAlN of NaCl  structure. It is found the two-phase structure of coatings: a small quantity of NaCl-type structure of TiAlN (TiN) and the disordered structure of the chains of polyhedra [TiNx] with x = 5 and x = 4. The chains of polyhedra [TiNx] with x = 4 are mainly formed at large discharge power of Al(Ti) target or at small content of N2 gas. <br> The Raman spectra, X-ray diffraction and hardness of the TiAlN films co-deposited on the steel substrates by reactive sputtering from Ti and Al targets in a mixture of N2 + Ar gas with two magnetrons at room temperature have been studied. From Raman spectra it is found that the position of high-frequency bands in vibrational spectra was located at 700-730 cm1 or in the region of 830  850 cm1 depending on the deposition parameters whereas it is not exceed 630 cm1 from TiAlN of NaCl  structure. It is found the two-phase structure of coatings: a small quantity of NaCl-type structure of TiAlN (TiN) and the disordered structure of the chains of polyhedra [TiNx] with x = 5 and x = 4. The chains of polyhedra [TiNx] with x = 4 are mainly formed at large discharge power of Al(Ti) target or at small content of N2 gas. <br> The Raman spectra, X-ray diffraction and hardness of the TiAlN films co-deposited on the steel substrates by reactive sputtering from Ti and Al targets in a mixture of N2 + Ar gas with two magnetrons at room temperature have been studied. From Raman spectra it is found that the position of high-frequency bands in vibrational spectra was located at 700-730 cm1 or in the region of 830  850 cm1 depending on the deposition parameters whereas it is not exceed 630 cm1 from TiAlN of NaCl  structure. It is found the two-phase structure of coatings: a small quantity of NaCl-type structure of TiAlN (TiN) and the disordered structure of the chains of polyhedra [TiNx] with x = 5 and x = 4. The chains of polyhedra [TiNx] with x = 4 are mainly formed at large discharge power of Al(Ti) target or at small content of N2 gas.
ISSN:2077-6772