Synthesis of nanocrystalline silicon thin films using the increase of the deposition pressure in the hot-wire chemical vapour deposition technique

Synthesis of nanocrystalline silicon thin films using the increase of the deposition pressure in the hot-wire chemical vapour deposition technique

Nanostructured thin silicon-based films have been deposited using the hot-wire chemical vapour deposition (HWCVD) technique at the University of the Western Cape. A variety of techniques including optical and infrared spectroscopy, Raman scattering spectroscopy, X-rays diffraction (XRD) and transmis...

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Bibliographic Details
Main Authors: S. Halindintwali, D. Knoesen, R. Swanepoel, B.A. Julies, C. Arendse, T. Muller, C.C. Theron, A. Gordijn, P.C.P. Bronsveld, J.K. Rath, R.E.I. Schropp
Format: Article
Language:English
Published: Academy of Science of South Africa 2009-07-01
Series:South African Journal of Science
Online Access:https://sajs.co.za/article/view/10289
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