Ultimate-scaled one-dimensional transistors: Surpassing the subthreshold swing limit

The continuous miniaturization of field-effect transistors (FETs) has propelled microprocessors to unprecedented levels of integration. However, further scaling encounters a critical trade-off between integration density and power efficiency. To transcend this limitation, a new class of steep-slope...

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Main Authors: Weiming Zhang, Jian Zhou, Bing Wang, Yuqi Sun, Zhimei Sun
Format: Article
Language:English
Published: Elsevier 2024-09-01
Series:Computational Materials Today
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Online Access:http://www.sciencedirect.com/science/article/pii/S2950463524000085
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author Weiming Zhang
Jian Zhou
Bing Wang
Yuqi Sun
Zhimei Sun
author_facet Weiming Zhang
Jian Zhou
Bing Wang
Yuqi Sun
Zhimei Sun
author_sort Weiming Zhang
collection DOAJ
description The continuous miniaturization of field-effect transistors (FETs) has propelled microprocessors to unprecedented levels of integration. However, further scaling encounters a critical trade-off between integration density and power efficiency. To transcend this limitation, a new class of steep-slope transistors has emerged, capable of surpassing the subthreshold swing (SS) limit but imposing stringent requirements on gate electrostatics. In this Perspective, we propose atomically-thin, one-dimensional (1D) materials as promising candidates for steep-slope switches. These materials offer distinct advantages in electrostatic integrity, crucial for overcoming traditional scaling bottlenecks. We delve into the underlying operational mechanisms to elucidate design methodologies and optimization strategies for 1D steep-slope transistors. We anticipate that by engineering the density of states distribution and carrier injection mechanisms, these transistors will achieve unparalleled performance and energy efficiency, representing a new frontier in device scaling. Our insights seek to facilitate future research and development in this transformative area of semiconductor technology.
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institution Kabale University
issn 2950-4635
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publishDate 2024-09-01
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series Computational Materials Today
spelling doaj-art-3cb6b829fec04155b2216e964065d03f2025-08-20T03:42:40ZengElsevierComputational Materials Today2950-46352024-09-01210000810.1016/j.commt.2024.100008Ultimate-scaled one-dimensional transistors: Surpassing the subthreshold swing limitWeiming Zhang0Jian Zhou1Bing Wang2Yuqi Sun3Zhimei Sun4School of Materials Science and Engineering, Beihang University, Beijing 100191, ChinaSchool of Materials Science and Engineering, Beihang University, Beijing 100191, ChinaSchool of Materials Science and Engineering, Beihang University, Beijing 100191, ChinaSchool of Materials Science and Engineering, Beihang University, Beijing 100191, ChinaCorresponding author.; School of Materials Science and Engineering, Beihang University, Beijing 100191, ChinaThe continuous miniaturization of field-effect transistors (FETs) has propelled microprocessors to unprecedented levels of integration. However, further scaling encounters a critical trade-off between integration density and power efficiency. To transcend this limitation, a new class of steep-slope transistors has emerged, capable of surpassing the subthreshold swing (SS) limit but imposing stringent requirements on gate electrostatics. In this Perspective, we propose atomically-thin, one-dimensional (1D) materials as promising candidates for steep-slope switches. These materials offer distinct advantages in electrostatic integrity, crucial for overcoming traditional scaling bottlenecks. We delve into the underlying operational mechanisms to elucidate design methodologies and optimization strategies for 1D steep-slope transistors. We anticipate that by engineering the density of states distribution and carrier injection mechanisms, these transistors will achieve unparalleled performance and energy efficiency, representing a new frontier in device scaling. Our insights seek to facilitate future research and development in this transformative area of semiconductor technology.http://www.sciencedirect.com/science/article/pii/S2950463524000085One-dimensionalField-effect transistorSubthreshold swingDensity of states engineeringInjection mechanism engineering
spellingShingle Weiming Zhang
Jian Zhou
Bing Wang
Yuqi Sun
Zhimei Sun
Ultimate-scaled one-dimensional transistors: Surpassing the subthreshold swing limit
Computational Materials Today
One-dimensional
Field-effect transistor
Subthreshold swing
Density of states engineering
Injection mechanism engineering
title Ultimate-scaled one-dimensional transistors: Surpassing the subthreshold swing limit
title_full Ultimate-scaled one-dimensional transistors: Surpassing the subthreshold swing limit
title_fullStr Ultimate-scaled one-dimensional transistors: Surpassing the subthreshold swing limit
title_full_unstemmed Ultimate-scaled one-dimensional transistors: Surpassing the subthreshold swing limit
title_short Ultimate-scaled one-dimensional transistors: Surpassing the subthreshold swing limit
title_sort ultimate scaled one dimensional transistors surpassing the subthreshold swing limit
topic One-dimensional
Field-effect transistor
Subthreshold swing
Density of states engineering
Injection mechanism engineering
url http://www.sciencedirect.com/science/article/pii/S2950463524000085
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AT yuqisun ultimatescaledonedimensionaltransistorssurpassingthesubthresholdswinglimit
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