Optimizing Crystalline MoS<sub>2</sub> Growth on Technologically Relevant Platinum Substrates Using Ionized Jet Deposition: Interface Interactions and Structural Insights

Transition metal dichalcogenides, especially molybdenum disulfide (MoS<sub>2</sub>), exhibit exceptional properties that make them suitable for a wide range of applications. However, the interaction between MoS<sub>2</sub> and technologically relevant substrates, such as plat...

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Main Authors: Cristian Tomasi Cebotari, Christos Gatsios, Andrea Pedrielli, Lucia Nasi, Francesca Rossi, Andrea Chiappini, Riccardo Ceccato, Roberto Verucchi, Marco V. Nardi, Melanie Timpel
Format: Article
Language:English
Published: MDPI AG 2025-06-01
Series:Surfaces
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Online Access:https://www.mdpi.com/2571-9637/8/2/38
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author Cristian Tomasi Cebotari
Christos Gatsios
Andrea Pedrielli
Lucia Nasi
Francesca Rossi
Andrea Chiappini
Riccardo Ceccato
Roberto Verucchi
Marco V. Nardi
Melanie Timpel
author_facet Cristian Tomasi Cebotari
Christos Gatsios
Andrea Pedrielli
Lucia Nasi
Francesca Rossi
Andrea Chiappini
Riccardo Ceccato
Roberto Verucchi
Marco V. Nardi
Melanie Timpel
author_sort Cristian Tomasi Cebotari
collection DOAJ
description Transition metal dichalcogenides, especially molybdenum disulfide (MoS<sub>2</sub>), exhibit exceptional properties that make them suitable for a wide range of applications. However, the interaction between MoS<sub>2</sub> and technologically relevant substrates, such as platinum (Pt) electrodes, can significantly influence its properties. This study investigates the growth and properties of MoS<sub>2</sub> thin films on Pt substrates using ionized jet deposition, a versatile, low-cost vacuum deposition technique. We explore the effects of the roughness of Pt substrates and self-heating during deposition on the chemical composition, structure, and strain of MoS<sub>2</sub> films. By optimizing the deposition system to achieve crystalline MoS<sub>2</sub> at room temperature, we compare as-deposited and annealed films. The results reveal that as-deposited MoS<sub>2</sub> films are initially amorphous and conform to the Pt substrate roughness, but crystalline growth is reached when the sample holder is sufficiently heated by the plasma. Further post-annealing at 270 °C enhances crystallinity and reduces sulfur-related defects. We also identify a change in the MoS<sub>2</sub>–Pt interface properties, with a reduction in Pt–S interactions after annealing. Our findings contribute to the understanding of MoS<sub>2</sub> growth on Pt and provide insights for optimizing MoS<sub>2</sub>-based devices in catalysis and electronics.
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spelling doaj-art-3c831e0912b04342ab5474e44e20d6ba2025-08-20T03:27:22ZengMDPI AGSurfaces2571-96372025-06-01823810.3390/surfaces8020038Optimizing Crystalline MoS<sub>2</sub> Growth on Technologically Relevant Platinum Substrates Using Ionized Jet Deposition: Interface Interactions and Structural InsightsCristian Tomasi Cebotari0Christos Gatsios1Andrea Pedrielli2Lucia Nasi3Francesca Rossi4Andrea Chiappini5Riccardo Ceccato6Roberto Verucchi7Marco V. Nardi8Melanie Timpel9IMEM-CNR Institute of Materials for Electronics and Magnetism, Trento Unit c/o Fondazione Bruno Kessler, Via alla Cascata 56/C, 38123 Trento, ItalyIMEM-CNR Institute of Materials for Electronics and Magnetism, Trento Unit c/o Fondazione Bruno Kessler, Via alla Cascata 56/C, 38123 Trento, ItalySensors and Devices Center, Fondazione Bruno Kessler, Via Sommarive 18, 38123 Trento, ItalyIMEM-CNR Institute of Materials for Electronics and Magnetism, Parco Area delle Scienze 37/A, 43124 Parma, ItalyIMEM-CNR Institute of Materials for Electronics and Magnetism, Parco Area delle Scienze 37/A, 43124 Parma, ItalyIFN-CNR, CSMFO Lab & FBK Photonics Unit, Via alla Cascata 56/C, Povo, 38123 Trento, ItalyDepartment of Industrial Engineering, University of Trento, Via Sommarive 9, 38123 Trento, ItalyIMEM-CNR Institute of Materials for Electronics and Magnetism, Trento Unit c/o Fondazione Bruno Kessler, Via alla Cascata 56/C, 38123 Trento, ItalyIMEM-CNR Institute of Materials for Electronics and Magnetism, Trento Unit c/o Fondazione Bruno Kessler, Via alla Cascata 56/C, 38123 Trento, ItalyIMEM-CNR Institute of Materials for Electronics and Magnetism, Trento Unit c/o Fondazione Bruno Kessler, Via alla Cascata 56/C, 38123 Trento, ItalyTransition metal dichalcogenides, especially molybdenum disulfide (MoS<sub>2</sub>), exhibit exceptional properties that make them suitable for a wide range of applications. However, the interaction between MoS<sub>2</sub> and technologically relevant substrates, such as platinum (Pt) electrodes, can significantly influence its properties. This study investigates the growth and properties of MoS<sub>2</sub> thin films on Pt substrates using ionized jet deposition, a versatile, low-cost vacuum deposition technique. We explore the effects of the roughness of Pt substrates and self-heating during deposition on the chemical composition, structure, and strain of MoS<sub>2</sub> films. By optimizing the deposition system to achieve crystalline MoS<sub>2</sub> at room temperature, we compare as-deposited and annealed films. The results reveal that as-deposited MoS<sub>2</sub> films are initially amorphous and conform to the Pt substrate roughness, but crystalline growth is reached when the sample holder is sufficiently heated by the plasma. Further post-annealing at 270 °C enhances crystallinity and reduces sulfur-related defects. We also identify a change in the MoS<sub>2</sub>–Pt interface properties, with a reduction in Pt–S interactions after annealing. Our findings contribute to the understanding of MoS<sub>2</sub> growth on Pt and provide insights for optimizing MoS<sub>2</sub>-based devices in catalysis and electronics.https://www.mdpi.com/2571-9637/8/2/38transition metal dichalcogenidesplatinumionized jet depositioninterfacephotoelectron spectroscopyelectronic properties
spellingShingle Cristian Tomasi Cebotari
Christos Gatsios
Andrea Pedrielli
Lucia Nasi
Francesca Rossi
Andrea Chiappini
Riccardo Ceccato
Roberto Verucchi
Marco V. Nardi
Melanie Timpel
Optimizing Crystalline MoS<sub>2</sub> Growth on Technologically Relevant Platinum Substrates Using Ionized Jet Deposition: Interface Interactions and Structural Insights
Surfaces
transition metal dichalcogenides
platinum
ionized jet deposition
interface
photoelectron spectroscopy
electronic properties
title Optimizing Crystalline MoS<sub>2</sub> Growth on Technologically Relevant Platinum Substrates Using Ionized Jet Deposition: Interface Interactions and Structural Insights
title_full Optimizing Crystalline MoS<sub>2</sub> Growth on Technologically Relevant Platinum Substrates Using Ionized Jet Deposition: Interface Interactions and Structural Insights
title_fullStr Optimizing Crystalline MoS<sub>2</sub> Growth on Technologically Relevant Platinum Substrates Using Ionized Jet Deposition: Interface Interactions and Structural Insights
title_full_unstemmed Optimizing Crystalline MoS<sub>2</sub> Growth on Technologically Relevant Platinum Substrates Using Ionized Jet Deposition: Interface Interactions and Structural Insights
title_short Optimizing Crystalline MoS<sub>2</sub> Growth on Technologically Relevant Platinum Substrates Using Ionized Jet Deposition: Interface Interactions and Structural Insights
title_sort optimizing crystalline mos sub 2 sub growth on technologically relevant platinum substrates using ionized jet deposition interface interactions and structural insights
topic transition metal dichalcogenides
platinum
ionized jet deposition
interface
photoelectron spectroscopy
electronic properties
url https://www.mdpi.com/2571-9637/8/2/38
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