Prediction of Wafer Performance: Use of Functional Outlier Detection and Regression

Prediction of Wafer Performance: Use of Functional Outlier Detection and Regression

Optical emission spectroscopy (OES) data is essential for virtual metrology, enabling accurate predictions of wafer performance in plasma etching processes. This approach not only reduces the need for physical measurements of product quality, leading to significant resource savings, but also support...

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Bibliographic Details
Main Authors: Kyusoon Kim, Seunghee Oh, Kiwook Bae, Hee-Seok Oh
Format: Article
Language:English
Published: IEEE 2025-01-01
Series:IEEE Access
Subjects:
Functional data analysis
functional independent component analysis
functional partial least squares
optical emission spectroscopy
virtual metrology
Online Access:https://ieeexplore.ieee.org/document/10898005/
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