TERMAL TREATMENT IMPACT ON STRUCTURE AND COMPOSITION OF POROUS ALUMINA FILMS FORMED AT DIFFERENT VALUES OF FORMING VOLTAGE
A fabrication of porous alumina films by electrochemical anodization of aluminium foils and aluminium films deposited on silicon wafers is presented. Anodization process was held in the 2 % sulphuric acid aqueous solution at different forming voltages. It was shown that thermal treatment at 450 °С a...
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| Main Authors: | , , |
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| Format: | Article |
| Language: | Russian |
| Published: |
Educational institution «Belarusian State University of Informatics and Radioelectronics»
2019-06-01
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| Series: | Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki |
| Subjects: | |
| Online Access: | https://doklady.bsuir.by/jour/article/view/367 |
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| Summary: | A fabrication of porous alumina films by electrochemical anodization of aluminium foils and aluminium films deposited on silicon wafers is presented. Anodization process was held in the 2 % sulphuric acid aqueous solution at different forming voltages. It was shown that thermal treatment at 450 °С and 950 °С leads to increase of anodic alumina film porosity and decrease of volume expansion factor. It was also defined that embedding of electrolyte components in anodic alumina during anodization in sulphuric acid solutions intensifies with the increase of forming voltage value. |
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| ISSN: | 1729-7648 |