Influence of Deposition Condition on Y2O3 Coatings Produced by Pulsed Electrophoretic Deposition
Y2O3 nanoparticle suspension aqueous solution was prepared using citric acid. Then, Y2O3 film was deposited using this solution with pulsed electrophoretic deposition (EPD). A dense Y2O3 film of 25.7 μm thickness was obtained with deposition conditions of 0.5 wt% Y2O3 concentration, bias voltage of...
Saved in:
| Main Authors: | , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Wiley
2016-01-01
|
| Series: | Advances in Materials Science and Engineering |
| Online Access: | http://dx.doi.org/10.1155/2016/9387651 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| _version_ | 1850218510003732480 |
|---|---|
| author | Hidetoshi Miyazaki Asumi Ichikawa Hisao Suzuki Toshitaka Ota |
| author_facet | Hidetoshi Miyazaki Asumi Ichikawa Hisao Suzuki Toshitaka Ota |
| author_sort | Hidetoshi Miyazaki |
| collection | DOAJ |
| description | Y2O3 nanoparticle suspension aqueous solution was prepared using citric acid. Then, Y2O3 film was deposited using this solution with pulsed electrophoretic deposition (EPD). A dense Y2O3 film of 25.7 μm thickness was obtained with deposition conditions of 0.5 wt% Y2O3 concentration, bias voltage of 0.5 V, and bias frequency of 1 kHz. The respective resistivities of the as-deposited film and films heat-treated at 200°C and 400°C were 2.84 × 103 Ω·cm, 5.36 × 104 Ω·cm, and 2.05 × 106 Ω·cm. A 59.8 μm thick dense Y2O3 film was obtained using two-step deposition with change of the bias voltage: a first step of 0.5 V and a second step of 2.0 V. |
| format | Article |
| id | doaj-art-36dae6d68eff466f9b6852c1af569aa0 |
| institution | OA Journals |
| issn | 1687-8434 1687-8442 |
| language | English |
| publishDate | 2016-01-01 |
| publisher | Wiley |
| record_format | Article |
| series | Advances in Materials Science and Engineering |
| spelling | doaj-art-36dae6d68eff466f9b6852c1af569aa02025-08-20T02:07:41ZengWileyAdvances in Materials Science and Engineering1687-84341687-84422016-01-01201610.1155/2016/93876519387651Influence of Deposition Condition on Y2O3 Coatings Produced by Pulsed Electrophoretic DepositionHidetoshi Miyazaki0Asumi Ichikawa1Hisao Suzuki2Toshitaka Ota3Interdisciplinary Graduate School of Science and Engineering, Shimane University, 1060 Nishikawatsu, Matsue, Shimane 690-8504, JapanInterdisciplinary Graduate School of Science and Engineering, Shimane University, 1060 Nishikawatsu, Matsue, Shimane 690-8504, JapanGraduate School of Science and Technology, Shizuoka University, 3-5-1 Johoku, Hamamatsu, Shizuoka 432-8561, JapanCeramic Research Laboratory, Nagoya Institute of Technology, 10-6-29 Asahigaoka, Tajimi, Gifu 507-0071, JapanY2O3 nanoparticle suspension aqueous solution was prepared using citric acid. Then, Y2O3 film was deposited using this solution with pulsed electrophoretic deposition (EPD). A dense Y2O3 film of 25.7 μm thickness was obtained with deposition conditions of 0.5 wt% Y2O3 concentration, bias voltage of 0.5 V, and bias frequency of 1 kHz. The respective resistivities of the as-deposited film and films heat-treated at 200°C and 400°C were 2.84 × 103 Ω·cm, 5.36 × 104 Ω·cm, and 2.05 × 106 Ω·cm. A 59.8 μm thick dense Y2O3 film was obtained using two-step deposition with change of the bias voltage: a first step of 0.5 V and a second step of 2.0 V.http://dx.doi.org/10.1155/2016/9387651 |
| spellingShingle | Hidetoshi Miyazaki Asumi Ichikawa Hisao Suzuki Toshitaka Ota Influence of Deposition Condition on Y2O3 Coatings Produced by Pulsed Electrophoretic Deposition Advances in Materials Science and Engineering |
| title | Influence of Deposition Condition on Y2O3 Coatings Produced by Pulsed Electrophoretic Deposition |
| title_full | Influence of Deposition Condition on Y2O3 Coatings Produced by Pulsed Electrophoretic Deposition |
| title_fullStr | Influence of Deposition Condition on Y2O3 Coatings Produced by Pulsed Electrophoretic Deposition |
| title_full_unstemmed | Influence of Deposition Condition on Y2O3 Coatings Produced by Pulsed Electrophoretic Deposition |
| title_short | Influence of Deposition Condition on Y2O3 Coatings Produced by Pulsed Electrophoretic Deposition |
| title_sort | influence of deposition condition on y2o3 coatings produced by pulsed electrophoretic deposition |
| url | http://dx.doi.org/10.1155/2016/9387651 |
| work_keys_str_mv | AT hidetoshimiyazaki influenceofdepositionconditionony2o3coatingsproducedbypulsedelectrophoreticdeposition AT asumiichikawa influenceofdepositionconditionony2o3coatingsproducedbypulsedelectrophoreticdeposition AT hisaosuzuki influenceofdepositionconditionony2o3coatingsproducedbypulsedelectrophoreticdeposition AT toshitakaota influenceofdepositionconditionony2o3coatingsproducedbypulsedelectrophoreticdeposition |