Assessment of plasma uniformity in the extraction region of an RF-driven negative ion source for CRAFT NNBI
The uniformity of beam, for large RF negative ion source, is closely related to the plasma uniformity in the extraction region. The six electrostatic probes were installed above the plasma grid (PG) 5 mm to evaluate the plasma uniformity. The influence of RF power, source pressure, magnetic filter f...
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| Format: | Article |
| Language: | English |
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IOP Publishing
2025-01-01
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| Series: | Nuclear Fusion |
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| Online Access: | https://doi.org/10.1088/1741-4326/adf11f |
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| author | Xufeng Peng Yongjian Xu Yufan Li Jianglong Wei Guangyong Mei Bo Liu YuWen Yang Na Wang Junwei Xie Yahong Xie Lizhen Liang Bin Wu |
| author_facet | Xufeng Peng Yongjian Xu Yufan Li Jianglong Wei Guangyong Mei Bo Liu YuWen Yang Na Wang Junwei Xie Yahong Xie Lizhen Liang Bin Wu |
| author_sort | Xufeng Peng |
| collection | DOAJ |
| description | The uniformity of beam, for large RF negative ion source, is closely related to the plasma uniformity in the extraction region. The six electrostatic probes were installed above the plasma grid (PG) 5 mm to evaluate the plasma uniformity. The influence of RF power, source pressure, magnetic filter field, and bias voltage on the plasma uniformity in the extraction region were analyzed. In the absence of magnetic filter field and bias voltage, the plasma density exhibits good uniformity (>90%), but the uniformity of electron temperature ( T _e ) is poor (>60%). It is mainly caused that the magnetic field was generated by the permanent magnet inside extraction grid (EG). The plasma density and T _e can be increased by increasing RF power, but it has little effect on the plasma uniformity. Increasing source pressure can effectively lower T _e and slightly improve its uniformity, but the uniformity of plasma density has deteriorated by increasing source pressure. While increasing the PG current effectively reduces the T _e in the extraction region, it simultaneously degrades the uniformity of both T _e and plasma density due to drift effects. Increasing the bias voltage can increase T _e in the extraction region when the PG current is 1200 A, but T _e at the bottom increases more significantly, thereby worsening the uniformity of T _e . In addition, the electron density ( N _e ) at the top decreases, while the N _e at the bottom increases, thereby improving the uniformity of N _e . The influence of the magnetic filtered field and bias voltage on the non-uniformity of T _e in the extraction region, as observed in the manuscript, is similar to the effect on the non-uniformity of the extracted beam current reported in the literature. These results provide theoretical foundations for optimizing the beam uniformity in large RF negative ion sources. |
| format | Article |
| id | doaj-art-346f2bbf47614164b077ea6716d9bef2 |
| institution | Kabale University |
| issn | 0029-5515 |
| language | English |
| publishDate | 2025-01-01 |
| publisher | IOP Publishing |
| record_format | Article |
| series | Nuclear Fusion |
| spelling | doaj-art-346f2bbf47614164b077ea6716d9bef22025-08-20T03:34:47ZengIOP PublishingNuclear Fusion0029-55152025-01-0165808604310.1088/1741-4326/adf11fAssessment of plasma uniformity in the extraction region of an RF-driven negative ion source for CRAFT NNBIXufeng Peng0https://orcid.org/0009-0002-0346-2123Yongjian Xu1https://orcid.org/0000-0001-7547-6319Yufan Li2https://orcid.org/0009-0000-6094-4132Jianglong Wei3https://orcid.org/0000-0002-2371-3842Guangyong Mei4https://orcid.org/0009-0009-9786-4190Bo Liu5https://orcid.org/0000-0001-8876-4221YuWen Yang6Na Wang7https://orcid.org/0000-0001-7005-2680Junwei Xie8https://orcid.org/0000-0002-2822-3359Yahong Xie9https://orcid.org/0000-0002-1374-6544Lizhen Liang10https://orcid.org/0000-0002-5744-5727Bin Wu11https://orcid.org/0000-0001-7198-5802Chinese Academy of Sciences, Institute of plasma physics, Hefei Institutes of Physical Science , Hefei 230031, China; University of Science and Technology of China , Hefei 230026, ChinaChinese Academy of Sciences, Institute of plasma physics, Hefei Institutes of Physical Science , Hefei 230031, China; University of Science and Technology of China , Hefei 230026, ChinaChinese Academy of Sciences, Institute of plasma physics, Hefei Institutes of Physical Science , Hefei 230031, China; University of Science and Technology of China , Hefei 230026, ChinaChinese Academy of Sciences, Institute of plasma physics, Hefei Institutes of Physical Science , Hefei 230031, China; University of Science and Technology of China , Hefei 230026, ChinaChinese Academy of Sciences, Institute of plasma physics, Hefei Institutes of Physical Science , Hefei 230031, China; University of Science and Technology of China , Hefei 230026, ChinaChinese Academy of Sciences, Institute of plasma physics, Hefei Institutes of Physical Science , Hefei 230031, China; University of Science and Technology of China , Hefei 230026, ChinaChinese Academy of Sciences, Institute of plasma physics, Hefei Institutes of Physical Science , Hefei 230031, China; University of Science and Technology of China , Hefei 230026, ChinaChinese Academy of Sciences, Institute of plasma physics, Hefei Institutes of Physical Science , Hefei 230031, China; University of Science and Technology of China , Hefei 230026, ChinaChinese Academy of Sciences, Institute of plasma physics, Hefei Institutes of Physical Science , Hefei 230031, China; University of Science and Technology of China , Hefei 230026, ChinaChinese Academy of Sciences, Institute of plasma physics, Hefei Institutes of Physical Science , Hefei 230031, China; University of Science and Technology of China , Hefei 230026, ChinaChinese Academy of Sciences, Institute of plasma physics, Hefei Institutes of Physical Science , Hefei 230031, China; University of Science and Technology of China , Hefei 230026, ChinaChinese Academy of Sciences, Institute of plasma physics, Hefei Institutes of Physical Science , Hefei 230031, China; University of Science and Technology of China , Hefei 230026, ChinaThe uniformity of beam, for large RF negative ion source, is closely related to the plasma uniformity in the extraction region. The six electrostatic probes were installed above the plasma grid (PG) 5 mm to evaluate the plasma uniformity. The influence of RF power, source pressure, magnetic filter field, and bias voltage on the plasma uniformity in the extraction region were analyzed. In the absence of magnetic filter field and bias voltage, the plasma density exhibits good uniformity (>90%), but the uniformity of electron temperature ( T _e ) is poor (>60%). It is mainly caused that the magnetic field was generated by the permanent magnet inside extraction grid (EG). The plasma density and T _e can be increased by increasing RF power, but it has little effect on the plasma uniformity. Increasing source pressure can effectively lower T _e and slightly improve its uniformity, but the uniformity of plasma density has deteriorated by increasing source pressure. While increasing the PG current effectively reduces the T _e in the extraction region, it simultaneously degrades the uniformity of both T _e and plasma density due to drift effects. Increasing the bias voltage can increase T _e in the extraction region when the PG current is 1200 A, but T _e at the bottom increases more significantly, thereby worsening the uniformity of T _e . In addition, the electron density ( N _e ) at the top decreases, while the N _e at the bottom increases, thereby improving the uniformity of N _e . The influence of the magnetic filtered field and bias voltage on the non-uniformity of T _e in the extraction region, as observed in the manuscript, is similar to the effect on the non-uniformity of the extracted beam current reported in the literature. These results provide theoretical foundations for optimizing the beam uniformity in large RF negative ion sources.https://doi.org/10.1088/1741-4326/adf11fnegative ion sourceelectrostatic probeextraction regionplasma uniformity |
| spellingShingle | Xufeng Peng Yongjian Xu Yufan Li Jianglong Wei Guangyong Mei Bo Liu YuWen Yang Na Wang Junwei Xie Yahong Xie Lizhen Liang Bin Wu Assessment of plasma uniformity in the extraction region of an RF-driven negative ion source for CRAFT NNBI Nuclear Fusion negative ion source electrostatic probe extraction region plasma uniformity |
| title | Assessment of plasma uniformity in the extraction region of an RF-driven negative ion source for CRAFT NNBI |
| title_full | Assessment of plasma uniformity in the extraction region of an RF-driven negative ion source for CRAFT NNBI |
| title_fullStr | Assessment of plasma uniformity in the extraction region of an RF-driven negative ion source for CRAFT NNBI |
| title_full_unstemmed | Assessment of plasma uniformity in the extraction region of an RF-driven negative ion source for CRAFT NNBI |
| title_short | Assessment of plasma uniformity in the extraction region of an RF-driven negative ion source for CRAFT NNBI |
| title_sort | assessment of plasma uniformity in the extraction region of an rf driven negative ion source for craft nnbi |
| topic | negative ion source electrostatic probe extraction region plasma uniformity |
| url | https://doi.org/10.1088/1741-4326/adf11f |
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