Superior Antireflection Coating for a Silicon Cell with a Micronanohybrid Structure
The object of this paper is to develop a high antireflection silicon solar cell. A novel two-stage metal-assisted etching (MAE) method is proposed for the fabrication of an antireflective layer of a micronanohybrid structure array. The processing time for the etching on an N-type high-resistance (NH...
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| Format: | Article |
| Language: | English |
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Wiley
2014-01-01
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| Series: | International Journal of Photoenergy |
| Online Access: | http://dx.doi.org/10.1155/2014/807812 |
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| author | Hsi-Chien Liu Gou-Jen Wang |
| author_facet | Hsi-Chien Liu Gou-Jen Wang |
| author_sort | Hsi-Chien Liu |
| collection | DOAJ |
| description | The object of this paper is to develop a high antireflection silicon solar cell. A novel two-stage metal-assisted etching (MAE) method is proposed for the fabrication of an antireflective layer of a micronanohybrid structure array. The processing time for the etching on an N-type high-resistance (NH) silicon wafer can be controlled to around 5 min. The resulting micronanohybrid structure array can achieve an average reflectivity of 1.21% for a light spectrum of 200–1000 nm. A P-N junction on the fabricated micronanohybrid structure array is formed using a low-cost liquid diffusion source. A high antireflection silicon solar cell with an average efficiency of 13.1% can be achieved. Compared with a conventional pyramid structure solar cell, the shorted circuit current of the proposed solar cell is increased by 73%. The major advantage of the two-stage MAE process is that a high antireflective silicon substrate can be fabricated cost-effectively in a relatively short time. The proposed method is feasible for the mass production of low-cost solar cells. |
| format | Article |
| id | doaj-art-32a2539ae2b448388e175913a0e89200 |
| institution | Kabale University |
| issn | 1110-662X 1687-529X |
| language | English |
| publishDate | 2014-01-01 |
| publisher | Wiley |
| record_format | Article |
| series | International Journal of Photoenergy |
| spelling | doaj-art-32a2539ae2b448388e175913a0e892002025-02-03T05:50:34ZengWileyInternational Journal of Photoenergy1110-662X1687-529X2014-01-01201410.1155/2014/807812807812Superior Antireflection Coating for a Silicon Cell with a Micronanohybrid StructureHsi-Chien Liu0Gou-Jen Wang1Department of Mechanical Engineering, National Chung Hsing University, Taichung 40227, TaiwanDepartment of Mechanical Engineering, National Chung Hsing University, Taichung 40227, TaiwanThe object of this paper is to develop a high antireflection silicon solar cell. A novel two-stage metal-assisted etching (MAE) method is proposed for the fabrication of an antireflective layer of a micronanohybrid structure array. The processing time for the etching on an N-type high-resistance (NH) silicon wafer can be controlled to around 5 min. The resulting micronanohybrid structure array can achieve an average reflectivity of 1.21% for a light spectrum of 200–1000 nm. A P-N junction on the fabricated micronanohybrid structure array is formed using a low-cost liquid diffusion source. A high antireflection silicon solar cell with an average efficiency of 13.1% can be achieved. Compared with a conventional pyramid structure solar cell, the shorted circuit current of the proposed solar cell is increased by 73%. The major advantage of the two-stage MAE process is that a high antireflective silicon substrate can be fabricated cost-effectively in a relatively short time. The proposed method is feasible for the mass production of low-cost solar cells.http://dx.doi.org/10.1155/2014/807812 |
| spellingShingle | Hsi-Chien Liu Gou-Jen Wang Superior Antireflection Coating for a Silicon Cell with a Micronanohybrid Structure International Journal of Photoenergy |
| title | Superior Antireflection Coating for a Silicon Cell with a Micronanohybrid Structure |
| title_full | Superior Antireflection Coating for a Silicon Cell with a Micronanohybrid Structure |
| title_fullStr | Superior Antireflection Coating for a Silicon Cell with a Micronanohybrid Structure |
| title_full_unstemmed | Superior Antireflection Coating for a Silicon Cell with a Micronanohybrid Structure |
| title_short | Superior Antireflection Coating for a Silicon Cell with a Micronanohybrid Structure |
| title_sort | superior antireflection coating for a silicon cell with a micronanohybrid structure |
| url | http://dx.doi.org/10.1155/2014/807812 |
| work_keys_str_mv | AT hsichienliu superiorantireflectioncoatingforasiliconcellwithamicronanohybridstructure AT goujenwang superiorantireflectioncoatingforasiliconcellwithamicronanohybridstructure |