Effect of Sputtering Process Parameters on Physical Properties and Electron Emission Level of Titanium Nitride Films
Titanium nitride (TiN) is a typical inorganic compound capable of achieving resistance modulation by adjusting the element ratio. In this work, to deeply investigate the resistance-tunable characteristics and electron emission properties of TiN, we prepared 10 sets of TiN films by adjusting the magn...
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| Main Authors: | Yang Xia, Dan Wang |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2025-06-01
|
| Series: | Inorganics |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2304-6740/13/6/201 |
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