Structural, Mechanical and Optical Properties of Plasma-chemical Si-C-N Films

Structural, Mechanical and Optical Properties of Plasma-chemical Si-C-N Films

An influence of the substrate temperature in the range of 40-400 °C on the properties of the Si-C-N films deposited by plasma enhanced chemical vapor deposition (PECVD) technique using hexamethyldisilazane is analyzed. Study of the structure, chemical bonding, surface morphology, mechanical properti...

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Bibliographic Details
Main Authors:	A.O. Kozak, V.I. Ivashchenko, O.K. Porada, L.A. Ivashchenko, T.V. Tomila
Format:	Article
Language:	English
Published:	Sumy State University 2014-11-01
Series:	Журнал нано- та електронної фізики
Subjects:	PECVD Hexamethyldisilazane Si-C-N films FTIR Nanoindentatio
Online Access:	http://jnep.sumdu.edu.ua/download/numbers/2014/4/articles/jnep_2014_V6_04047.pdf
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