Interfacial Defect Characteristics and Low-temperature Electrical Properties of the Germanium Oxynitride Passivation Film for Ge-Based Metal Oxide Semiconductor and High-Purity Germanium Detectors

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Main Authors: Shengjie Du, Xiuxia Li, Menglin Qiu, Yaohui Zhu, Weiyou Tang, Zhi Deng, Yang Tian, Yulan Li, Ke Jia, Zhengcao Li, Jianping Cheng, Shasha Lv
Format: Article
Language:English
Published: American Chemical Society 2025-06-01
Series:ACS Omega
Online Access:https://doi.org/10.1021/acsomega.4c07343
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author Shengjie Du
Xiuxia Li
Menglin Qiu
Yaohui Zhu
Weiyou Tang
Zhi Deng
Yang Tian
Yulan Li
Ke Jia
Zhengcao Li
Jianping Cheng
Shasha Lv
author_facet Shengjie Du
Xiuxia Li
Menglin Qiu
Yaohui Zhu
Weiyou Tang
Zhi Deng
Yang Tian
Yulan Li
Ke Jia
Zhengcao Li
Jianping Cheng
Shasha Lv
author_sort Shengjie Du
collection DOAJ
format Article
id doaj-art-2f046737005e42b0981437e1eb4cee4d
institution DOAJ
issn 2470-1343
language English
publishDate 2025-06-01
publisher American Chemical Society
record_format Article
series ACS Omega
spelling doaj-art-2f046737005e42b0981437e1eb4cee4d2025-08-20T03:21:31ZengAmerican Chemical SocietyACS Omega2470-13432025-06-011023240092401710.1021/acsomega.4c07343Interfacial Defect Characteristics and Low-temperature Electrical Properties of the Germanium Oxynitride Passivation Film for Ge-Based Metal Oxide Semiconductor and High-Purity Germanium DetectorsShengjie Du0Xiuxia Li1Menglin Qiu2Yaohui Zhu3Weiyou Tang4Zhi Deng5Yang Tian6Yulan Li7Ke Jia8Zhengcao Li9Jianping Cheng10Shasha Lv11Key Laboratory of Beam Technology of Ministry of Education, College of Nuclear Science and Technology, Beijing Normal University, Beijing, ChinaGreater Bay Area National Center of Technology Innovation, Particle Application Technology Innovation Center, Beijing, ChinaKey Laboratory of Beam Technology of Ministry of Education, College of Nuclear Science and Technology, Beijing Normal University, Beijing, ChinaKey Laboratory of Beam Technology of Ministry of Education, College of Nuclear Science and Technology, Beijing Normal University, Beijing, ChinaGreater Bay Area National Center of Technology Innovation, Particle Application Technology Innovation Center, Beijing, ChinaDepartment of Engineering Physics, Key Laboratory of Particle & Radiation Imaging of Ministry of Education, Tsinghua University, Beijing, ChinaDepartment of Engineering Physics, Key Laboratory of Particle & Radiation Imaging of Ministry of Education, Tsinghua University, Beijing, ChinaDepartment of Engineering Physics, Key Laboratory of Particle & Radiation Imaging of Ministry of Education, Tsinghua University, Beijing, ChinaKey Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, Beijing, ChinaKey Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, Beijing, ChinaKey Laboratory of Beam Technology of Ministry of Education, College of Nuclear Science and Technology, Beijing Normal University, Beijing, ChinaKey Laboratory of Beam Technology of Ministry of Education, College of Nuclear Science and Technology, Beijing Normal University, Beijing, Chinahttps://doi.org/10.1021/acsomega.4c07343
spellingShingle Shengjie Du
Xiuxia Li
Menglin Qiu
Yaohui Zhu
Weiyou Tang
Zhi Deng
Yang Tian
Yulan Li
Ke Jia
Zhengcao Li
Jianping Cheng
Shasha Lv
Interfacial Defect Characteristics and Low-temperature Electrical Properties of the Germanium Oxynitride Passivation Film for Ge-Based Metal Oxide Semiconductor and High-Purity Germanium Detectors
ACS Omega
title Interfacial Defect Characteristics and Low-temperature Electrical Properties of the Germanium Oxynitride Passivation Film for Ge-Based Metal Oxide Semiconductor and High-Purity Germanium Detectors
title_full Interfacial Defect Characteristics and Low-temperature Electrical Properties of the Germanium Oxynitride Passivation Film for Ge-Based Metal Oxide Semiconductor and High-Purity Germanium Detectors
title_fullStr Interfacial Defect Characteristics and Low-temperature Electrical Properties of the Germanium Oxynitride Passivation Film for Ge-Based Metal Oxide Semiconductor and High-Purity Germanium Detectors
title_full_unstemmed Interfacial Defect Characteristics and Low-temperature Electrical Properties of the Germanium Oxynitride Passivation Film for Ge-Based Metal Oxide Semiconductor and High-Purity Germanium Detectors
title_short Interfacial Defect Characteristics and Low-temperature Electrical Properties of the Germanium Oxynitride Passivation Film for Ge-Based Metal Oxide Semiconductor and High-Purity Germanium Detectors
title_sort interfacial defect characteristics and low temperature electrical properties of the germanium oxynitride passivation film for ge based metal oxide semiconductor and high purity germanium detectors
url https://doi.org/10.1021/acsomega.4c07343
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