A universal approach for thin high-entropy oxides regulated by Ga2O3 layers for oxygen evolution reaction

Abstract High-entropy oxides (HEOs) are a class of promising materials with multielement tunability and untold scientific merits, yet the controllable preparation of nano-sized HEOs is notoriously difficult. Herein, we utilize the natural oxide layer on liquid gallium as an ideal substrate to facili...

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Main Authors: Wenyang Zhang, Huixin Jin, Yanna Guo, Yinghao Cui, Jingyu Qin, Jianxin Zhang, Yusuke Yamauchi, Yoshiyuki Sugahara
Format: Article
Language:English
Published: Nature Portfolio 2025-07-01
Series:Nature Communications
Online Access:https://doi.org/10.1038/s41467-025-60399-9
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author Wenyang Zhang
Huixin Jin
Yanna Guo
Yinghao Cui
Jingyu Qin
Jianxin Zhang
Yusuke Yamauchi
Yoshiyuki Sugahara
author_facet Wenyang Zhang
Huixin Jin
Yanna Guo
Yinghao Cui
Jingyu Qin
Jianxin Zhang
Yusuke Yamauchi
Yoshiyuki Sugahara
author_sort Wenyang Zhang
collection DOAJ
description Abstract High-entropy oxides (HEOs) are a class of promising materials with multielement tunability and untold scientific merits, yet the controllable preparation of nano-sized HEOs is notoriously difficult. Herein, we utilize the natural oxide layer on liquid gallium as an ideal substrate to facilitate the synthesis of thin HEO. Through experiments and density functional theory (DFT) calculations, it is found that Ga2O3 layer exhibits a strong affinity for metal ions and oxides, which not only enables it to anchor multiple metal ions and facilitate the formation of HEO, but also introduces a strain effect that can lower the free-energy barrier for oxygen evolution reaction (OER). It increases the exposed surface area and active sites of HEO, enhancing its reaction efficiency. As a result, the Ga2O3-supported thin HEO film (Mn0.65Fe0.59Co0.83Ni0.48Zn0.45O4) shows satisfactory OER performance compared with other control groups. This study exemplifies the potential of the liquid Ga2O3 layer as an affinity substrate for high-entropy material synthesis.
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institution Kabale University
issn 2041-1723
language English
publishDate 2025-07-01
publisher Nature Portfolio
record_format Article
series Nature Communications
spelling doaj-art-2b51cb905cca4dd5a978bc526859dda32025-08-20T04:03:06ZengNature PortfolioNature Communications2041-17232025-07-0116111110.1038/s41467-025-60399-9A universal approach for thin high-entropy oxides regulated by Ga2O3 layers for oxygen evolution reactionWenyang Zhang0Huixin Jin1Yanna Guo2Yinghao Cui3Jingyu Qin4Jianxin Zhang5Yusuke Yamauchi6Yoshiyuki Sugahara7School of Advanced Science and Engineering, Waseda University, ShinjukuDepartment of Materials Science and Technology, Tokyo University of ScienceSchool of Advanced Science and Engineering, Waseda University, ShinjukuSchool of Advanced Science and Engineering, Waseda University, ShinjukuSchool of Materials Science and Engineering, Shandong University, No. 17923, Jingshi RoadSchool of Materials Science and Engineering, Shandong University, No. 17923, Jingshi RoadDepartment of Materials Process Engineering Graduate School of Engineering, Nagoya UniversitySchool of Advanced Science and Engineering, Waseda University, ShinjukuAbstract High-entropy oxides (HEOs) are a class of promising materials with multielement tunability and untold scientific merits, yet the controllable preparation of nano-sized HEOs is notoriously difficult. Herein, we utilize the natural oxide layer on liquid gallium as an ideal substrate to facilitate the synthesis of thin HEO. Through experiments and density functional theory (DFT) calculations, it is found that Ga2O3 layer exhibits a strong affinity for metal ions and oxides, which not only enables it to anchor multiple metal ions and facilitate the formation of HEO, but also introduces a strain effect that can lower the free-energy barrier for oxygen evolution reaction (OER). It increases the exposed surface area and active sites of HEO, enhancing its reaction efficiency. As a result, the Ga2O3-supported thin HEO film (Mn0.65Fe0.59Co0.83Ni0.48Zn0.45O4) shows satisfactory OER performance compared with other control groups. This study exemplifies the potential of the liquid Ga2O3 layer as an affinity substrate for high-entropy material synthesis.https://doi.org/10.1038/s41467-025-60399-9
spellingShingle Wenyang Zhang
Huixin Jin
Yanna Guo
Yinghao Cui
Jingyu Qin
Jianxin Zhang
Yusuke Yamauchi
Yoshiyuki Sugahara
A universal approach for thin high-entropy oxides regulated by Ga2O3 layers for oxygen evolution reaction
Nature Communications
title A universal approach for thin high-entropy oxides regulated by Ga2O3 layers for oxygen evolution reaction
title_full A universal approach for thin high-entropy oxides regulated by Ga2O3 layers for oxygen evolution reaction
title_fullStr A universal approach for thin high-entropy oxides regulated by Ga2O3 layers for oxygen evolution reaction
title_full_unstemmed A universal approach for thin high-entropy oxides regulated by Ga2O3 layers for oxygen evolution reaction
title_short A universal approach for thin high-entropy oxides regulated by Ga2O3 layers for oxygen evolution reaction
title_sort universal approach for thin high entropy oxides regulated by ga2o3 layers for oxygen evolution reaction
url https://doi.org/10.1038/s41467-025-60399-9
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