A New Chemical Mechanical Slurry for Polishing Yttrium Aluminium Garnet Material with Magnesium oxide, Sodium Metasilicate Pentahydrate and Zirconium Dioxide Abrasive Particles

A New Chemical Mechanical Slurry for Polishing Yttrium Aluminium Garnet Material with Magnesium oxide, Sodium Metasilicate Pentahydrate and Zirconium Dioxide Abrasive Particles

This work provided a new chemical-mechanical polishing mixture with MgO, sodium metasilicate pentahydrate, ZrO2 abrasive particles, and deionized water. With chemical-mechanical slurry (CMS) proposed for polishing yttrium aluminum oxide (Y3Al5O12) the surface reaction layer formed with significantly...

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Bibliographic Details
Main Authors: Le Anh Duc, Pham Minh Hieu, Nguyen Minh Quang
Format: Article
Language:English
Published: Publishing House of Wrocław Board of Scientific Technical Societies Federation NOT 2023-02-01
Series:Journal of Machine Engineering
Subjects:
abrasive particles
chemical mechanical polishing
yttrium aluminium garnet
magnesium oxide
Online Access:http://jmacheng.not.pl/A-New-Chemical-Mechanical-Slurry-for-Polishing-Yttrium-Aluminium-Garnet-Material,159661,0,2.html
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