Frequency-Decoupled Dual-Stage Inverse Lithography Optimization via Hierarchical Sampling and Morphological Enhancement
Inverse lithography technology (ILT) plays a pivotal role in advanced semiconductor manufacturing because it enables pixel-level mask modifications, significantly enhances pattern fidelity, and expands process windows. However, traditional gradient-based ILT methods often struggle with the trade-off...
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| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2025-04-01
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| Series: | Micromachines |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2072-666X/16/5/515 |
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