Deep-UV laser direct writing of photoluminescent ZnO submicron patterns: an example of nanoarchitectonics concept

Micro- and nanopatterning of metal oxide materials is an important process to develop electronic or optoelectronic devices. ZnO is a material of choice for its semiconducting and photoluminescence properties. In the frame of the nanoarchitectonics concept, we have developed and investigated a new pr...

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Main Authors: Quentin Kirscher, Samar Hajjar-Garreau, Fabien Grasset, Dominique Berling, Olivier Soppera
Format: Article
Language:English
Published: Taylor & Francis Group 2022-12-01
Series:Science and Technology of Advanced Materials
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Online Access:https://www.tandfonline.com/doi/10.1080/14686996.2022.2116294
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author Quentin Kirscher
Samar Hajjar-Garreau
Fabien Grasset
Dominique Berling
Olivier Soppera
author_facet Quentin Kirscher
Samar Hajjar-Garreau
Fabien Grasset
Dominique Berling
Olivier Soppera
author_sort Quentin Kirscher
collection DOAJ
description Micro- and nanopatterning of metal oxide materials is an important process to develop electronic or optoelectronic devices. ZnO is a material of choice for its semiconducting and photoluminescence properties. In the frame of the nanoarchitectonics concept, we have developed and investigated a new process that relies on direct writing laser patterning in the Deep-UV (DUV) range to prepare photoluminescent microstructures of ZnO at room temperature, under air. This process is based on a synthesis of colloidal ZnO nanocrystals (NCs) with a careful choice of the ligands on the surface to obtain an optimal (i) stability of the colloids, (ii) redissolution of the non-insolated parts and (iii) cross-linking of the DUV-insolated parts. The mechanisms of photocrosslinking are studied by different spectroscopic methods. This room temperature process preserves the photoluminescence properties of the NCs and the wavelength used in DUV allows to reach a sub-micrometer resolution, which opens new perspectives for the integration of microstructures on flexible substrates for optoelectronic applications.
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publishDate 2022-12-01
publisher Taylor & Francis Group
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series Science and Technology of Advanced Materials
spelling doaj-art-21f5f17802514766be0aafe4e9ec43d52025-08-20T02:26:40ZengTaylor & Francis GroupScience and Technology of Advanced Materials1468-69961878-55142022-12-0123153554610.1080/14686996.2022.2116294Deep-UV laser direct writing of photoluminescent ZnO submicron patterns: an example of nanoarchitectonics conceptQuentin Kirscher0Samar Hajjar-Garreau1Fabien Grasset2Dominique Berling3Olivier Soppera4Institut de Science des Matériaux de Mulhouse (IS2M) UMR 7361 CNRS-UHA, Université de Haute Alsace, Mulhouse, FranceInstitut de Science des Matériaux de Mulhouse (IS2M) UMR 7361 CNRS-UHA, Université de Haute Alsace, Mulhouse, FranceCNRS-Saint Gobain-NIMS, IRL 3629, Laboratory for Innovative Key Materials and Structures (LINK), National Institute for Materials Science (NIMS), Tsukuba, JapanInstitut de Science des Matériaux de Mulhouse (IS2M) UMR 7361 CNRS-UHA, Université de Haute Alsace, Mulhouse, FranceInstitut de Science des Matériaux de Mulhouse (IS2M) UMR 7361 CNRS-UHA, Université de Haute Alsace, Mulhouse, FranceMicro- and nanopatterning of metal oxide materials is an important process to develop electronic or optoelectronic devices. ZnO is a material of choice for its semiconducting and photoluminescence properties. In the frame of the nanoarchitectonics concept, we have developed and investigated a new process that relies on direct writing laser patterning in the Deep-UV (DUV) range to prepare photoluminescent microstructures of ZnO at room temperature, under air. This process is based on a synthesis of colloidal ZnO nanocrystals (NCs) with a careful choice of the ligands on the surface to obtain an optimal (i) stability of the colloids, (ii) redissolution of the non-insolated parts and (iii) cross-linking of the DUV-insolated parts. The mechanisms of photocrosslinking are studied by different spectroscopic methods. This room temperature process preserves the photoluminescence properties of the NCs and the wavelength used in DUV allows to reach a sub-micrometer resolution, which opens new perspectives for the integration of microstructures on flexible substrates for optoelectronic applications.https://www.tandfonline.com/doi/10.1080/14686996.2022.2116294ZnOnanocrystalsphotolithographyphotoluminescenceoptical coatingsnanoarchitectonics
spellingShingle Quentin Kirscher
Samar Hajjar-Garreau
Fabien Grasset
Dominique Berling
Olivier Soppera
Deep-UV laser direct writing of photoluminescent ZnO submicron patterns: an example of nanoarchitectonics concept
Science and Technology of Advanced Materials
ZnO
nanocrystals
photolithography
photoluminescence
optical coatings
nanoarchitectonics
title Deep-UV laser direct writing of photoluminescent ZnO submicron patterns: an example of nanoarchitectonics concept
title_full Deep-UV laser direct writing of photoluminescent ZnO submicron patterns: an example of nanoarchitectonics concept
title_fullStr Deep-UV laser direct writing of photoluminescent ZnO submicron patterns: an example of nanoarchitectonics concept
title_full_unstemmed Deep-UV laser direct writing of photoluminescent ZnO submicron patterns: an example of nanoarchitectonics concept
title_short Deep-UV laser direct writing of photoluminescent ZnO submicron patterns: an example of nanoarchitectonics concept
title_sort deep uv laser direct writing of photoluminescent zno submicron patterns an example of nanoarchitectonics concept
topic ZnO
nanocrystals
photolithography
photoluminescence
optical coatings
nanoarchitectonics
url https://www.tandfonline.com/doi/10.1080/14686996.2022.2116294
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