Matsumoto, K., Kato, H., Yu, J., Hanafusa, H., & Higashi, S. Ultra-fast etching of photoresist by reactive atmospheric-pressure thermal plasma jet with surface temperature measurement. IOP Publishing.
Chicago Style (17th ed.) CitationMatsumoto, Kyohei, Hibiki Kato, Jiawen Yu, Hiroaki Hanafusa, and Seiichiro Higashi. Ultra-fast Etching of Photoresist by Reactive Atmospheric-pressure Thermal Plasma Jet with Surface Temperature Measurement. IOP Publishing.
MLA (9th ed.) CitationMatsumoto, Kyohei, et al. Ultra-fast Etching of Photoresist by Reactive Atmospheric-pressure Thermal Plasma Jet with Surface Temperature Measurement. IOP Publishing.
Warning: These citations may not always be 100% accurate.