Modeling and Simulation of a Chemical Vapor Deposition
We are motivated to model PE-CVD (plasma enhanced chemical vapor deposition) processes for metallic bipolar plates, and their optimization for depositing a heterogeneous layer on the metallic plate. Moreover a constraint to the deposition process is a very low pressure (nearly a vacuum) and a low te...
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| Format: | Article |
| Language: | English |
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Wiley
2011-01-01
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| Series: | Journal of Applied Mathematics |
| Online Access: | http://dx.doi.org/10.1155/2011/641920 |
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| author | J. Geiser M. Arab |
| author_facet | J. Geiser M. Arab |
| author_sort | J. Geiser |
| collection | DOAJ |
| description | We are motivated to model PE-CVD (plasma enhanced chemical vapor deposition) processes for metallic bipolar plates, and their optimization for depositing a heterogeneous layer on the metallic plate. Moreover a constraint to the deposition process is a very low pressure (nearly a vacuum) and a low temperature (about 400 K). The contribution of this paper is to derive a multiphysics system of multiple physics problems that includes some assumptions to simplify the complicate
process and allows of deriving a computable mathematical model without neglecting the real-life processes.
To model the gaseous transport in the apparatus we employ mobile gas phase streams, immobile and mobile phases in a chamber that is filled with porous medium (plasma layers). Numerical methods are discussed to solve such multi-scale and multi phase models and to obtain qualitative results for the delicate multiphysical processes in the chamber. We discuss a splitting analysis to couple such multiphysical problems. The verification of such a complicated model is done with real-life experiments
for single species. Such numerical simulations help to economize on expensive physical experiments and obtain control mechanisms for the delicate deposition process. |
| format | Article |
| id | doaj-art-1909bb439e7244a8900dfbdb757129d8 |
| institution | Kabale University |
| issn | 1110-757X 1687-0042 |
| language | English |
| publishDate | 2011-01-01 |
| publisher | Wiley |
| record_format | Article |
| series | Journal of Applied Mathematics |
| spelling | doaj-art-1909bb439e7244a8900dfbdb757129d82025-02-03T01:23:28ZengWileyJournal of Applied Mathematics1110-757X1687-00422011-01-01201110.1155/2011/641920641920Modeling and Simulation of a Chemical Vapor DepositionJ. Geiser0M. Arab1Department of Mathematics, Humboldt University of Berlin, Unter den Linden 6, D-10099 Berlin, GermanyDepartment of Mathematics, Humboldt University of Berlin, Unter den Linden 6, D-10099 Berlin, GermanyWe are motivated to model PE-CVD (plasma enhanced chemical vapor deposition) processes for metallic bipolar plates, and their optimization for depositing a heterogeneous layer on the metallic plate. Moreover a constraint to the deposition process is a very low pressure (nearly a vacuum) and a low temperature (about 400 K). The contribution of this paper is to derive a multiphysics system of multiple physics problems that includes some assumptions to simplify the complicate process and allows of deriving a computable mathematical model without neglecting the real-life processes. To model the gaseous transport in the apparatus we employ mobile gas phase streams, immobile and mobile phases in a chamber that is filled with porous medium (plasma layers). Numerical methods are discussed to solve such multi-scale and multi phase models and to obtain qualitative results for the delicate multiphysical processes in the chamber. We discuss a splitting analysis to couple such multiphysical problems. The verification of such a complicated model is done with real-life experiments for single species. Such numerical simulations help to economize on expensive physical experiments and obtain control mechanisms for the delicate deposition process.http://dx.doi.org/10.1155/2011/641920 |
| spellingShingle | J. Geiser M. Arab Modeling and Simulation of a Chemical Vapor Deposition Journal of Applied Mathematics |
| title | Modeling and Simulation of a Chemical Vapor Deposition |
| title_full | Modeling and Simulation of a Chemical Vapor Deposition |
| title_fullStr | Modeling and Simulation of a Chemical Vapor Deposition |
| title_full_unstemmed | Modeling and Simulation of a Chemical Vapor Deposition |
| title_short | Modeling and Simulation of a Chemical Vapor Deposition |
| title_sort | modeling and simulation of a chemical vapor deposition |
| url | http://dx.doi.org/10.1155/2011/641920 |
| work_keys_str_mv | AT jgeiser modelingandsimulationofachemicalvapordeposition AT marab modelingandsimulationofachemicalvapordeposition |