Impact of KOH Wet Treatment on the Electrical and Optical Characteristics of GaN-Based Red μLEDs

Micro-size light-emitting diodes (μLEDs) are high-brightness, low-power optoelectronic devices with significant potential in display technology, lighting, and biomedical applications. AlGaInP-based red LEDs experience severe size-dependent effects when scaled to the micron level, and addressing the...

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Main Authors: Shuhan Zhang, Yun Zhang, Hongyu Qin, Qian Fan, Xianfeng Ni, Li Tao, Xing Gu
Format: Article
Language:English
Published: MDPI AG 2025-03-01
Series:Crystals
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Online Access:https://www.mdpi.com/2073-4352/15/4/288
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author Shuhan Zhang
Yun Zhang
Hongyu Qin
Qian Fan
Xianfeng Ni
Li Tao
Xing Gu
author_facet Shuhan Zhang
Yun Zhang
Hongyu Qin
Qian Fan
Xianfeng Ni
Li Tao
Xing Gu
author_sort Shuhan Zhang
collection DOAJ
description Micro-size light-emitting diodes (μLEDs) are high-brightness, low-power optoelectronic devices with significant potential in display technology, lighting, and biomedical applications. AlGaInP-based red LEDs experience severe size-dependent effects when scaled to the micron level, and addressing the fabrication challenges of GaN-based red μLED arrays is crucial for achieving homogeneous integration. This study investigates the employment of KOH wet treatments to alleviate efficiency degradation caused by sidewall leakage currents. GaN-based red μLED arrays with pixel sizes ranging from 5 × 5 µm<sup>2</sup> to 20 × 20 µm<sup>2</sup> were grown using metal-organic chemical vapor deposition (MOCVD), and then fabricated via rapid thermal annealing, mesa etching, sidewall wet treatment, electrode deposition, sidewall passivation, chemical-mechanical polishing, and via processes. The arrays, with pixel densities ranging from 668 PPI (Pixel Per Inch) to 1336 PPI, consist of 10,000 to 40,000 emitting pixels, and their optoelectronic properties were systematically evaluated. The arrays with varying pixel sizes fabricated in this study were subjected to three distinct processing conditions: without KOH treatment, 3 min of KOH treatment, and 5 min of KOH treatment. Electrical characterization reveals that the 5-min KOH treatment significantly reduces leakage current, enhancing the electrical performance, as compared to the samples without KOH treatment or 3-min treatment. In terms of optical properties, while the arrays without any KOH treatment failed to emit light, the ones with 3- and 5-min KOH treatment exhibit excellent optical uniformity and negligible blue shift. Most arrays treated for 5 min demonstrate superior light output power (LOP) and optoelectronic efficiency, with the 5 µm pixel arrays exhibiting unexpectedly high performance. The results suggest that extending the KOH wet treatment time effectively mitigates sidewall defects, reduces non-radiative recombination, and enhances surface roughness, thereby minimizing optical losses. These findings provide valuable insights for optimizing the fabrication of high-performance GaN-based red μLEDs and contribute to the development of stable, high-quality small-pixel μLEDs for advanced display and lighting applications.
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spelling doaj-art-1623302ef6704ca290f180116b93ce212025-08-20T02:17:24ZengMDPI AGCrystals2073-43522025-03-0115428810.3390/cryst15040288Impact of KOH Wet Treatment on the Electrical and Optical Characteristics of GaN-Based Red μLEDsShuhan Zhang0Yun Zhang1Hongyu Qin2Qian Fan3Xianfeng Ni4Li Tao5Xing Gu6Institute of Next Generation Semiconductor Materials, Southeast University, Suzhou 215123, ChinaInstitute of Next Generation Semiconductor Materials, Southeast University, Suzhou 215123, ChinaInstitute of Next Generation Semiconductor Materials, Southeast University, Suzhou 215123, ChinaInstitute of Next Generation Semiconductor Materials, Southeast University, Suzhou 215123, ChinaInstitute of Next Generation Semiconductor Materials, Southeast University, Suzhou 215123, ChinaInstitute of Next Generation Semiconductor Materials, Southeast University, Suzhou 215123, ChinaInstitute of Next Generation Semiconductor Materials, Southeast University, Suzhou 215123, ChinaMicro-size light-emitting diodes (μLEDs) are high-brightness, low-power optoelectronic devices with significant potential in display technology, lighting, and biomedical applications. AlGaInP-based red LEDs experience severe size-dependent effects when scaled to the micron level, and addressing the fabrication challenges of GaN-based red μLED arrays is crucial for achieving homogeneous integration. This study investigates the employment of KOH wet treatments to alleviate efficiency degradation caused by sidewall leakage currents. GaN-based red μLED arrays with pixel sizes ranging from 5 × 5 µm<sup>2</sup> to 20 × 20 µm<sup>2</sup> were grown using metal-organic chemical vapor deposition (MOCVD), and then fabricated via rapid thermal annealing, mesa etching, sidewall wet treatment, electrode deposition, sidewall passivation, chemical-mechanical polishing, and via processes. The arrays, with pixel densities ranging from 668 PPI (Pixel Per Inch) to 1336 PPI, consist of 10,000 to 40,000 emitting pixels, and their optoelectronic properties were systematically evaluated. The arrays with varying pixel sizes fabricated in this study were subjected to three distinct processing conditions: without KOH treatment, 3 min of KOH treatment, and 5 min of KOH treatment. Electrical characterization reveals that the 5-min KOH treatment significantly reduces leakage current, enhancing the electrical performance, as compared to the samples without KOH treatment or 3-min treatment. In terms of optical properties, while the arrays without any KOH treatment failed to emit light, the ones with 3- and 5-min KOH treatment exhibit excellent optical uniformity and negligible blue shift. Most arrays treated for 5 min demonstrate superior light output power (LOP) and optoelectronic efficiency, with the 5 µm pixel arrays exhibiting unexpectedly high performance. The results suggest that extending the KOH wet treatment time effectively mitigates sidewall defects, reduces non-radiative recombination, and enhances surface roughness, thereby minimizing optical losses. These findings provide valuable insights for optimizing the fabrication of high-performance GaN-based red μLEDs and contribute to the development of stable, high-quality small-pixel μLEDs for advanced display and lighting applications.https://www.mdpi.com/2073-4352/15/4/288μLEDsKOH wet treatmentGaN
spellingShingle Shuhan Zhang
Yun Zhang
Hongyu Qin
Qian Fan
Xianfeng Ni
Li Tao
Xing Gu
Impact of KOH Wet Treatment on the Electrical and Optical Characteristics of GaN-Based Red μLEDs
Crystals
μLEDs
KOH wet treatment
GaN
title Impact of KOH Wet Treatment on the Electrical and Optical Characteristics of GaN-Based Red μLEDs
title_full Impact of KOH Wet Treatment on the Electrical and Optical Characteristics of GaN-Based Red μLEDs
title_fullStr Impact of KOH Wet Treatment on the Electrical and Optical Characteristics of GaN-Based Red μLEDs
title_full_unstemmed Impact of KOH Wet Treatment on the Electrical and Optical Characteristics of GaN-Based Red μLEDs
title_short Impact of KOH Wet Treatment on the Electrical and Optical Characteristics of GaN-Based Red μLEDs
title_sort impact of koh wet treatment on the electrical and optical characteristics of gan based red μleds
topic μLEDs
KOH wet treatment
GaN
url https://www.mdpi.com/2073-4352/15/4/288
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