The effect of hydrogen ion bombardment on the capping layers of extreme ultraviolet mirrors
Extreme ultraviolet (EUV) mirrors demand exceptionally high reflectivity, but contamination from carbon, tin, oxide layers, and etching debris during use can degrade their performance and reduce production yields. Hydrogen ion bombardment is commonly employed for surface cleaning; however, prolonged...
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| Main Authors: | Kuan-Wei Lu, Kuan-Yu Ko, Ai-Ling Shih, Duy Thanh Cu, Meng-Chi Li, Chien-Cheng Kuo |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
IOP Publishing
2025-01-01
|
| Series: | Materials Research Express |
| Subjects: | |
| Online Access: | https://doi.org/10.1088/2053-1591/adca00 |
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