Laser Process for Selective Emitter Silicon Solar Cells

Selective emitter solar cells can provide a significant increase in conversion efficiency. However current approaches need many technological steps and alignment procedures. This paper reports on a preliminary attempt to reduce the number of processing steps and therefore the cost of selective emitt...

Full description

Saved in:
Bibliographic Details
Main Authors: G. Poulain, D. Blanc, A. Focsa, B. Bazer-Bachi, M. Gauthier, B. Semmache, Y. Pellegrin, N. Le Quang, M. Lemiti
Format: Article
Language:English
Published: Wiley 2012-01-01
Series:International Journal of Photoenergy
Online Access:http://dx.doi.org/10.1155/2012/413863
Tags: Add Tag
No Tags, Be the first to tag this record!
_version_ 1832552140261818368
author G. Poulain
D. Blanc
A. Focsa
B. Bazer-Bachi
M. Gauthier
B. Semmache
Y. Pellegrin
N. Le Quang
M. Lemiti
author_facet G. Poulain
D. Blanc
A. Focsa
B. Bazer-Bachi
M. Gauthier
B. Semmache
Y. Pellegrin
N. Le Quang
M. Lemiti
author_sort G. Poulain
collection DOAJ
description Selective emitter solar cells can provide a significant increase in conversion efficiency. However current approaches need many technological steps and alignment procedures. This paper reports on a preliminary attempt to reduce the number of processing steps and therefore the cost of selective emitter cells. In the developed procedure, a phosphorous glass covered with silicon nitride acts as the doping source. A laser is used to open locally the antireflection coating and at the same time achieve local phosphorus diffusion. In this process the standard chemical etching of the phosphorous glass is avoided. Sheet resistance variation from 100 Ω/sq to 40 Ω/sq is demonstrated with a nanosecond UV laser. Numerical simulation of the laser-matter interaction is discussed to understand the dopant diffusion efficiency. Preliminary solar cells results show a 0.5% improvement compared with a homogeneous emitter structure.
format Article
id doaj-art-15d90f6822184b26a09387b39034fa20
institution Kabale University
issn 1110-662X
1687-529X
language English
publishDate 2012-01-01
publisher Wiley
record_format Article
series International Journal of Photoenergy
spelling doaj-art-15d90f6822184b26a09387b39034fa202025-02-03T05:59:28ZengWileyInternational Journal of Photoenergy1110-662X1687-529X2012-01-01201210.1155/2012/413863413863Laser Process for Selective Emitter Silicon Solar CellsG. Poulain0D. Blanc1A. Focsa2B. Bazer-Bachi3M. Gauthier4B. Semmache5Y. Pellegrin6N. Le Quang7M. Lemiti8Institut des Nanotechnologies de Lyon INL-UMR5270, CNRS, INSA de Lyon, Université de Lyon, 69621 Villeurbanne, FranceInstitut des Nanotechnologies de Lyon INL-UMR5270, CNRS, INSA de Lyon, Université de Lyon, 69621 Villeurbanne, FranceInstitut des Nanotechnologies de Lyon INL-UMR5270, CNRS, INSA de Lyon, Université de Lyon, 69621 Villeurbanne, FranceInstitut des Nanotechnologies de Lyon INL-UMR5270, CNRS, INSA de Lyon, Université de Lyon, 69621 Villeurbanne, FrancePhotowatt International S.A.S., 33 rue Saint Honoré, 38300 Bourgoin-Jallieu, FranceSEMCO Engineering, 625, rue de la Croix Verte-Parc Euromédecine, 34196 Montpellier Cedex 5, FranceSEMCO Engineering, 625, rue de la Croix Verte-Parc Euromédecine, 34196 Montpellier Cedex 5, FrancePhotowatt International S.A.S., 33 rue Saint Honoré, 38300 Bourgoin-Jallieu, FranceInstitut des Nanotechnologies de Lyon INL-UMR5270, CNRS, INSA de Lyon, Université de Lyon, 69621 Villeurbanne, FranceSelective emitter solar cells can provide a significant increase in conversion efficiency. However current approaches need many technological steps and alignment procedures. This paper reports on a preliminary attempt to reduce the number of processing steps and therefore the cost of selective emitter cells. In the developed procedure, a phosphorous glass covered with silicon nitride acts as the doping source. A laser is used to open locally the antireflection coating and at the same time achieve local phosphorus diffusion. In this process the standard chemical etching of the phosphorous glass is avoided. Sheet resistance variation from 100 Ω/sq to 40 Ω/sq is demonstrated with a nanosecond UV laser. Numerical simulation of the laser-matter interaction is discussed to understand the dopant diffusion efficiency. Preliminary solar cells results show a 0.5% improvement compared with a homogeneous emitter structure.http://dx.doi.org/10.1155/2012/413863
spellingShingle G. Poulain
D. Blanc
A. Focsa
B. Bazer-Bachi
M. Gauthier
B. Semmache
Y. Pellegrin
N. Le Quang
M. Lemiti
Laser Process for Selective Emitter Silicon Solar Cells
International Journal of Photoenergy
title Laser Process for Selective Emitter Silicon Solar Cells
title_full Laser Process for Selective Emitter Silicon Solar Cells
title_fullStr Laser Process for Selective Emitter Silicon Solar Cells
title_full_unstemmed Laser Process for Selective Emitter Silicon Solar Cells
title_short Laser Process for Selective Emitter Silicon Solar Cells
title_sort laser process for selective emitter silicon solar cells
url http://dx.doi.org/10.1155/2012/413863
work_keys_str_mv AT gpoulain laserprocessforselectiveemittersiliconsolarcells
AT dblanc laserprocessforselectiveemittersiliconsolarcells
AT afocsa laserprocessforselectiveemittersiliconsolarcells
AT bbazerbachi laserprocessforselectiveemittersiliconsolarcells
AT mgauthier laserprocessforselectiveemittersiliconsolarcells
AT bsemmache laserprocessforselectiveemittersiliconsolarcells
AT ypellegrin laserprocessforselectiveemittersiliconsolarcells
AT nlequang laserprocessforselectiveemittersiliconsolarcells
AT mlemiti laserprocessforselectiveemittersiliconsolarcells