Ohmic Resistance Correction for an Inductive Modulator in DC-Condition Biassed Plasma Antennas, While Modulation the Signal in the VLF Band
In this research, the performance of an inductive modulator during energy injection into a straight rod plasma antenna, activated using a DC electric discharge, has been experimentally investigated. The primary focus of this study is on correcting one of the parameters of the inductive modulator, sp...
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| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
Wiley
2025-01-01
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| Series: | Active and Passive Electronic Components |
| Online Access: | http://dx.doi.org/10.1155/apec/3239863 |
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| Summary: | In this research, the performance of an inductive modulator during energy injection into a straight rod plasma antenna, activated using a DC electric discharge, has been experimentally investigated. The primary focus of this study is on correcting one of the parameters of the inductive modulator, specifically its ohmic resistance. The variations in the ohmic resistance of the modulator with respect to frequency in the very low frequency (VLF) range, between 100 kHz and 50 MHz, are analyzed. This analysis is conducted under varying pressures within the plasma antenna tube. Additionally, the effect of the modulator’s position, whether near or far from the cathode, on the modified ohmic resistance variations is examined and simulated in this study. |
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| ISSN: | 1563-5031 |